Inventor · disambiguated record
Shimao Yoneyama
Also filed as: YONEYAMA SHIMAO
3 granted patents·210 citations·filing 1996–2010
78Inventor score
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3 records- 0195US8551289B2Plasma processing apparatusNISHIMURA EIICHI·Filed 2010·Granted Oct 8, 2013·46 cites·19 claims
- 0286US5965034AHigh frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balancedMC ELECTRONICS CO LTD·Filed 1996·Granted Oct 12, 1999·115 cites·20 claims
- 0384US6858112B2Process depending on plasma discharges sustained by inductive couplingHITACHI INT ELECTRIC CO LTD·Filed 1996·Granted Feb 22, 2005·49 cites·14 claims
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