Inventor · disambiguated record
Takeshi Shimoaoki
Also filed as: SHIMOAOKI TAKESHI
8 granted patents·5 pending applications·16 citations·filing 2005–2024
79Inventor score
Top patents by PatentIndex Score
13 records- 0178US7419773B2Rinsing method and developing methodTOKYO ELECTRON LTD·Filed 2007·Granted Sep 2, 2008·6 cites·20 claims
- 0277US11079679B2Substrate processing method and recording medium capable of suppressing non-uniformity in degree of progression of processing depending on position on substrateTOKYO ELECTRON LTD·Filed 2019·Granted Aug 3, 2021·1 cites·18 claims
- 0376US7977039B2Rinse treatment method, developing treatment method and developing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jul 12, 2011·6 cites·3 claims
- 0475US9690202B2Developing method, developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jun 27, 2017·2 cites·16 claims
- 0569US10359702B2Development processing apparatus, development processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Jul 23, 2019·1 cites·10 claims
- 0654US2024248413A1Substrate treatment method and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0754US2018157178A1Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 0850US2025005737A1Substrate processing apparatus, information processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0949US2009042149A1Rinsing method and developing methodNAITOU RYOUICHIROU·Filed 2008·Application pending·0 cites
- 1044US10203605B2Development method, development device, and non-transitory computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Feb 12, 2019·0 cites·9 claims
- 1140US10108111B1Developing method, developing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 23, 2018·0 cites·15 claims
- 1238US2009004607A1Substrate Processing MethodSHIMOAOKI TAKESHI·Filed 2005·Application pending·0 cites
- 1336US10185220B2Substrate processing method, substrate processing apparatus, and non-transitory computer-readable mediumTOKYO ELECTRON LTD·Filed 2016·Granted Jan 22, 2019·0 cites·13 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →