Inventor · disambiguated record
Yeni Burk
Also filed as: BURK YENI
7 granted patents·3 pending applications·4 citations·filing 2012–2020
72Inventor score
Top patents by PatentIndex Score
10 records- 0176US11970647B2Composition, its use and a process for selectively etching silicon-germanium materialBASF SE·Filed 2020·Granted Apr 30, 2024·1 cites·18 claims
- 0274US11180719B2Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or belowBASF SE·Filed 2018·Granted Nov 23, 2021·2 cites·15 claims
- 0362US12146125B2Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or belowBASF SE·Filed 2019·Granted Nov 19, 2024·0 cites·8 claims
- 0450US8957174B2Process for preparing an aqueous polymer dispersionBURK YENI·Filed 2012·Granted Feb 17, 2015·1 cites·15 claims
- 0549US2021395513A1Epoxy resin compositionBASF SE·Filed 2019·Application pending·0 cites
- 0648US11674048B2Aqueous polymer compositions for flexible roof coatingsBASF SE·Filed 2018·Granted Jun 13, 2023·0 cites·17 claims
- 0744US10336912B2Methods for producing and using aqueous polyurethane/polyacrylate hybrid dispersions and use of said aqueous polyurethane/polyacrylate hybrid dispersions in coating agentsBASF SE·Filed 2015·Granted Jul 2, 2019·0 cites·24 claims
- 0843US11742197B2Cleavable additives for use in a method of making a semiconductor substrateBASF SE·Filed 2019·Granted Aug 29, 2023·0 cites·8 claims
- 0943US2022324885A1Twin-monomer composition and dielectric film thereofBASF SE·Filed 2020·Application pending·0 cites
- 1040US2022187712A1Composition for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below comprising a boron-type additiveBASF SE·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →