Inventor · disambiguated record
Brian Sy-Yuan Shieh
Also filed as: SHIEH BRIAN · SHIEH BRIAN SY-YUAN
7 granted patents·6 pending applications·598 citations·filing 1993–2011
90Inventor score
Top patents by PatentIndex Score
13 records- 0198US5643394AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1994·Granted Jul 1, 1997·215 cites·73 claims
- 0293US6949203B2System level in-situ integrated dielectric etch process particularly useful for copper dual damasceneAPPLIED MATERIALS INC·Filed 2003·Granted Sep 27, 2005·69 cites·46 claims
- 0391US5545289APassivating, stripping and corrosion inhibition of semiconductor substratesAPPLIED MATERIALS INC·Filed 1994·Granted Aug 13, 1996·184 cites·91 claims
- 0490US9714465B2Gas distribution blocker apparatusTSUEI LUN·Filed 2009·Granted Jul 25, 2017·30 cites·18 claims
- 0588US6500357B1System level in-situ integrated dielectric etch process particularly useful for copper dual damasceneAPPLIED MATERIALS INC·Filed 2000·Granted Dec 31, 2002·38 cites·14 claims
- 0673US5384009APlasma etching using xenonAPPLIED MATERIALS INC·Filed 1993·Granted Jan 24, 1995·57 cites·26 claims
- 0760US2010037823A1Showerhead and shadow frameAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 0859US2010104754A1Multiple gas feed apparatus and methodAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 0959US2010112212A1Adjustable gas distribution apparatusAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 1058US6793835B2System level in-situ integrated dielectric etch process particularly useful for copper dual damasceneFiled 2002·Granted Sep 21, 2004·5 cites·12 claims
- 1157US2013012030A1Method and apparatus for remote plasma source assisted silicon-containing film depositionAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1249US2011275200A1Methods of dynamically controlling film microstructure formed in a microcrystalline layerAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 1349US2010151127A1Apparatus and method for preventing process system contaminationAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
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