Inventor · disambiguated record
Shingo Kanamitsu
Also filed as: KANAMITSU SHINGO · KANAMITSU SR SHINGO
21 granted patents·7 pending applications·151 citations·filing 2000–2022
93Inventor score
Top patents by PatentIndex Score
28 records- 0193US6335129B1Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo maskTOSHIBA KK·Filed 2000·Granted Jan 1, 2002·70 cites·20 claims
- 0289US8778572B2Photomask and pattern forming methodFUKUHARA KAZUYA·Filed 2012·Granted Jul 15, 2014·6 cites·19 claims
- 0387US7927770B2Defect correction method for EUV maskTOSHIBA KK·Filed 2009·Granted Apr 19, 2011·13 cites·18 claims
- 0486US6991878B2Photomask repair method and apparatusTOSHIBA KK·Filed 2002·Granted Jan 31, 2006·23 cites·18 claims
- 0580US6740456B2Method of correcting a photomask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2002·Granted May 25, 2004·19 cites·16 claims
- 0678US9377682B2Template substrate, method for manufacturing same, and templateKANAMITSU SHINGO·Filed 2012·Granted Jun 28, 2016·5 cites·19 claims
- 0773US11762286B2Template manufacturing method and template base memberKIOXIA CORP·Filed 2022·Granted Sep 19, 2023·0 cites·18 claims
- 0873US11061324B2Manufacturing method of replica template, manufacturing method of semiconductor device, and master templateTOSHIBA MEMORY CORP·Filed 2018·Granted Jul 13, 2021·2 cites·14 claims
- 0967US9412592B2Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2014·Granted Aug 9, 2016·1 cites·11 claims
- 1067US7094504B2Mask, manufacturing method for mask, and manufacturing method for semiconductor deviceTOSHIBA KK·Filed 2003·Granted Aug 22, 2006·7 cites·29 claims
- 1166US8758005B2Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor deviceITOH MASAMITSU·Filed 2011·Granted Jun 24, 2014·1 cites·7 claims
- 1265US11294276B2Template manufacturing method and template base memberKIOXIA CORP·Filed 2017·Granted Apr 5, 2022·0 cites·5 claims
- 1359US11796910B2Template, manufacturing method of templateKIOXIA CORP·Filed 2021·Granted Oct 24, 2023·0 cites·4 claims
- 1453US7541136B2Mask, manufacturing method for mask, and manufacturing method for semiconductor deviceTOSHIBA KK·Filed 2006·Granted Jun 2, 2009·0 cites·15 claims
- 1551US7569313B2White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2006·Granted Aug 4, 2009·0 cites·11 claims
- 1649US10459355B2Template substrate and manufacturing method thereofTOSHIBA MEMORY CORP·Filed 2016·Granted Oct 29, 2019·0 cites·8 claims
- 1749US9383641B2Method of repairing defect and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2014·Granted Jul 5, 2016·0 cites·15 claims
- 1849US7947413B2Pattern evaluation methodTOSHIBA KK·Filed 2008·Granted May 24, 2011·0 cites·18 claims
- 1948US2015258226A1Substrate storing case, substrate cleaning apparatus and substrate storing case cleaning apparatusTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2045US10274821B2Mask and manufacturing method of maskTOSHIBA MEMORY CORP·Filed 2017·Granted Apr 30, 2019·0 cites·10 claims
- 2145US2010186768A1Foreign matter removing method for lithographic plate and method for manufacturing lithographic plateKANAMITSU SHINGO·Filed 2009·Application pending·0 cites
- 2244US10241394B2Pattern formation method, control device, and semiconductor device manufacture methodTOSHIBA MEMORY CORP·Filed 2015·Granted Mar 26, 2019·0 cites·10 claims
- 2344US2020249567A1Imprint templates, method for manufacturing imprint templates, and method for manufacturing semiconductor devicesTOSHIBA MEMORY CORP·Filed 2019·Application pending·0 cites
- 2444US2015092045A1Surface State Evaluation Apparatus and Surface State Evaluation MethodTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2543US2014170565A1Pattern forming method and method for manufacturing template for imprintTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2643US2010092876A1Method for repairing photo mask, system for repairing photo mask and program for repairing photo maskKANAMITSU SHINGO·Filed 2009·Application pending·0 cites
- 2743US2010051056A1Foreign object removal method and method for manufacturing semiconductor deviceKANAMITSU SHINGO·Filed 2009·Application pending·0 cites
- 2842US7371483B2Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 13, 2008·4 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →