Inventor · disambiguated record
Anthony Wilby
Also filed as: WILBY ANTHONY · WILBY ANTHONY P · WILBY ANTHONY PAUL
9 granted patents·1 pending application·7 citations·filing 2009–2022
79Inventor score
Top patents by PatentIndex Score
10 records- 0172US11127568B2Plasma etching apparatusSPTS TECHNOLOGIES LTD·Filed 2019·Granted Sep 21, 2021·1 cites·16 claims
- 0269US10153135B2Plasma etching apparatusSPTS TECHNOLOGIES LTD·Filed 2016·Granted Dec 11, 2018·2 cites·22 claims
- 0367US8454805B2Method of depositing amorphus aluminium oxynitride layer by reactive sputtering of an aluminium target in a nitrogen/oxygen atmosphereWILBY ANTHONY·Filed 2009·Granted Jun 4, 2013·2 cites·20 claims
- 0466US11961722B2Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor depositionSPTS TECHNOLOGIES LTD·Filed 2022·Granted Apr 16, 2024·0 cites·17 claims
- 0565US10622193B2Plasma etching apparatusSPTS TECHNOLOGIES LTD·Filed 2015·Granted Apr 14, 2020·1 cites·25 claims
- 0662US9728432B2Method of degassingSPTS TECHNOLOGIES LTD·Filed 2015·Granted Aug 8, 2017·1 cites·13 claims
- 0749US11521840B2Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor depositionSPTS TECHNOLOGIES LTD·Filed 2018·Granted Dec 6, 2022·0 cites·7 claims
- 0842US8728953B2Method and apparatus for processing a semiconductor workpieceSPTS TECHNOLOGIES LTD·Filed 2013·Granted May 20, 2014·0 cites·19 claims
- 0938US2015225841A1Method of processing a substrateSPTS TECHNOLOGIES LTD·Filed 2015·Application pending·0 cites
- 1029US8337675B2Method of plasma vapour depositionCARRUTHERS MARK IAN·Filed 2010·Granted Dec 25, 2012·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →