Inventor · disambiguated record
Henricus Wilhelmus Maria Van Buel
Also filed as: VAN BUEL HENRICUS · VAN BUEL HENRICUS WILHELMUS MA · VAN BUEL HENRICUS WILHELMUS MARIA
33 granted patents·5 pending applications·213 citations·filing 2002–2023
97Inventor score
Top patents by PatentIndex Score
38 records- 0198US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0297US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 0397US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 0494US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
- 0593US10331043B2Optimization of target arrangement and associated targetASML NETHERLANDS BV·Filed 2015·Granted Jun 25, 2019·6 cites·20 claims
- 0689US12276921B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Apr 15, 2025·2 cites·17 claims
- 0786US6936385B2Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methodsASML NETHERLANDS BV·Filed 2003·Granted Aug 30, 2005·37 cites·26 claims
- 0882US12429328B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 0981US10162272B2Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Dec 25, 2018·2 cites·23 claims
- 1081US7094506B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Aug 22, 2006·15 cites·11 claims
- 1180US7562686B2Method and system for 3D alignment in wafer scale integrationASML NETHERLANDS BV·Filed 2005·Granted Jul 21, 2009·10 cites·11 claims
- 1279US6618118B2Optical exposure method, device manufacturing method and lithographic projection apparatusASML NETHERLANDS BV·Filed 2002·Granted Sep 9, 2003·18 cites·22 claims
- 1377US7751047B2Alignment and alignment marksASML NETHERLANDS BV·Filed 2005·Granted Jul 6, 2010·8 cites·17 claims
- 1477US7420676B2Alignment method, method of measuring front to backside alignment error, method of detecting non-orthogonality, method of calibration, and lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Sep 2, 2008·19 cites·25 claims
- 1577US7349071B2Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 25, 2008·4 cites·19 claims
- 1677US7084955B2Lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Aug 1, 2006·11 cites·16 claims
- 1776US11123773B2Apparatus for and a method of removing contaminant particles from a component of an apparatusASML NETHERLANDS BV·Filed 2018·Granted Sep 21, 2021·3 cites·14 claims
- 1875US7251018B2Substrate table, method of measuring a position of a substrate and a lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Jul 31, 2007·16 cites·10 claims
- 1975US7064807B2Lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Jun 20, 2006·10 cites·42 claims
- 2073US7463337B2Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·3 cites·4 claims
- 2169US7480028B2Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer programASML NETHERLANDS BV·Filed 2005·Granted Jan 20, 2009·3 cites·26 claims
- 2265US7113258B2Lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Sep 26, 2006·9 cites·18 claims
- 2363US2025348008A1Single pad overlay measurementASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2461US10101677B2Inspection apparatus for measuring properties of a target structure, methods of operating an optical system, method of manufacturing devicesASML NETHERLANDS BV·Filed 2016·Granted Oct 16, 2018·1 cites·12 claims
- 2558US8576374B2Lithographic apparatus and methodBEST KEITH FRANK·Filed 2009·Granted Nov 5, 2013·3 cites·6 claims
- 2657US7253884B2Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Aug 7, 2007·5 cites·24 claims
- 2756US6914664B2Lithographic apparatus, alignment method and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jul 5, 2005·5 cites·25 claims
- 2855US7675606B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2006·Granted Mar 9, 2010·1 cites·30 claims
- 2954US7563562B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jul 21, 2009·0 cites·11 claims
- 3047US7193231B2Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Mar 20, 2007·1 cites·23 claims
- 3145US7342642B2Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Mar 11, 2008·0 cites·14 claims
- 3245US2008204683A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3343US2009075012A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3440US7239393B2Calibration method for a lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 3, 2007·0 cites·19 claims
- 3539US7041996B2Method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted May 9, 2006·0 cites·23 claims
- 3637US2009207399A1Lithographic methodASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 3736US2008170308A1Cover for shielding a portion of an arc lampASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3832US8395772B2Sensor, a table and lithographic apparatusVAN BUEL HENRICUS WILHELMUS MARIA·Filed 2010·Granted Mar 12, 2013·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →