Inventor · disambiguated record
Tsutomu Shoki
Also filed as: SHOKI TSUTOMU
76 granted patents·6 pending applications·268 citations·filing 1997–2024
99Inventor score
Top patents by PatentIndex Score
82 records- 0198US11480867B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Oct 25, 2022·4 cites·21 claims
- 0297US12111566B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2023·Granted Oct 8, 2024·2 cites·16 claims
- 0397US12105413B2Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2023·Granted Oct 1, 2024·2 cites·20 claims
- 0497US11815807B2Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Nov 14, 2023·2 cites·19 claims
- 0597US10481484B2Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Nov 19, 2019·12 cites·20 claims
- 0694US11531264B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2019·Granted Dec 20, 2022·4 cites·17 claims
- 0794US9864267B2Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Jan 9, 2018·8 cites·12 claims
- 0893US11550215B2Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Jan 10, 2023·3 cites·18 claims
- 0992US9195131B2Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the sameHOYA CORP·Filed 2012·Granted Nov 24, 2015·7 cites·16 claims
- 1091US10001699B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Jun 19, 2018·6 cites·14 claims
- 1191US7390596B2Reflection type mask blank and reflection type mask and production methods for themHOYA CORP·Filed 2003·Granted Jun 24, 2008·42 cites·38 claims
- 1289US9377679B2Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2013·Granted Jun 28, 2016·5 cites·19 claims
- 1388US11187972B2Reflective mask blank, method of manufacturing reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Nov 30, 2021·3 cites·21 claims
- 1488US2024393675A1Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2024·Application pending·0 cites
- 1587US12313968B2Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2024·Granted May 27, 2025·0 cites·15 claims
- 1687US8512918B2Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the sameSHOKI TSUTOMU·Filed 2010·Granted Aug 20, 2013·10 cites·24 claims
- 1785US12025911B2Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2023·Granted Jul 2, 2024·0 cites·17 claims
- 1885US7981573B2Reflective mask blank, reflective mask and methods of producing the mask blank and the maskHOYA CORP·Filed 2008·Granted Jul 19, 2011·7 cites·10 claims
- 1984US11003068B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted May 11, 2021·2 cites·20 claims
- 2083US10921705B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Feb 16, 2021·2 cites·16 claims
- 2183US8372564B2Reflective mask, reflective mask blank and method of manufacturing reflective maskHOYA CORP·Filed 2009·Granted Feb 12, 2013·6 cites·21 claims
- 2281US12135496B2Reflective mask blank and reflective maskHOYA CORP·Filed 2023·Granted Nov 5, 2024·0 cites·20 claims
- 2381US11262647B2Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing methodHOYA CORP·Filed 2018·Granted Mar 1, 2022·1 cites·22 claims
- 2481US9897909B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2016·Granted Feb 20, 2018·2 cites·8 claims
- 2579US11681214B2Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Jun 20, 2023·0 cites·19 claims
- 2678US11880130B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Jan 23, 2024·0 cites·19 claims
- 2778US11815806B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2022·Granted Nov 14, 2023·0 cites·21 claims
- 2878US9720315B2Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Aug 1, 2017·2 cites·18 claims
- 2976US9726969B2Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Aug 8, 2017·2 cites·18 claims
- 3075US10126641B2Multilayer reflective film formed substrate, reflective mask blank, mask blank, methods of manufacturing the same, reflective mask, and maskHOYA CORP·Filed 2016·Granted Nov 13, 2018·1 cites·15 claims
- 3175US9348217B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted May 24, 2016·2 cites·15 claims
- 3275US6737201B2Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor deviceHOYA CORP·Filed 2001·Granted May 18, 2004·14 cites·15 claims
- 3374US10606166B2Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Mar 31, 2020·1 cites·20 claims
- 3474US9494851B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2013·Granted Nov 15, 2016·2 cites·30 claims
- 3574US9323141B2Method for producing substrate with multilayer reflective film, method for producing reflective mask blank and method for producing reflective maskHOYA CORP·Filed 2015·Granted Apr 26, 2016·1 cites·15 claims
- 3672US11852964B2Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 3772US10067419B2Method for manufacturing reflective mask blank, and method for manufacturing reflective maskHOYA CORP·Filed 2014·Granted Sep 4, 2018·1 cites·11 claims
- 3872US6749973B2Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the maskHOYA CORP·Filed 2002·Granted Jun 15, 2004·14 cites·11 claims
- 3971US9229316B2Method for producing substrate with multilayer reflective film, method for producing reflective mask blank and method for producing reflective maskHOYA CORP·Filed 2013·Granted Jan 5, 2016·1 cites·21 claims
- 4070US12072619B2Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor deviceHOYA CORP·Filed 2020·Granted Aug 27, 2024·0 cites·19 claims
- 4170US7910264B2Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective filmHOYA CORP·Filed 2007·Granted Mar 22, 2011·2 cites·14 claims
- 4270US7056627B2Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type maskHOYA CORP·Filed 2003·Granted Jun 6, 2006·10 cites·11 claims
- 4369US10996554B2Substrate with an electrically conductive film, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2020·Granted May 4, 2021·0 cites·21 claims
- 4469US8367279B2Reflective mask blank, reflective mask, and method of manufacturing the sameHOYA CORP·Filed 2009·Granted Feb 5, 2013·2 cites·23 claims
- 4565US10620527B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2019·Granted Apr 14, 2020·0 cites·20 claims
- 4665US8748062B2Method of cleaning substrateYAMAUCHI KAZUTO·Filed 2012·Granted Jun 10, 2014·1 cites·7 claims
- 4762US6797368B2Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposureHOYA CORP·Filed 2003·Granted Sep 28, 2004·5 cites·10 claims
- 4861US11131921B2Method for manufacturing reflective mask blank, and method for manufacturing reflective maskHOYA CORP·Filed 2018·Granted Sep 28, 2021·0 cites·12 claims
- 4960US10429728B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2017·Granted Oct 1, 2019·0 cites·21 claims
- 5060US10295900B2Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication methodHOYA CORP·Filed 2018·Granted May 21, 2019·0 cites·26 claims
Showing the top 50 of 82 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →