Inventor · disambiguated record
Atsuro Inada
Also filed as: INADA ATSURO
12 granted patents·5 pending applications·26 citations·filing 2005–2024
85Inventor score
Top patents by PatentIndex Score
17 records- 0196US11127854B2Semiconductor device and method of manufacturing sameTOSHIBA KK·Filed 2020·Granted Sep 21, 2021·4 cites·12 claims
- 0284US9696489B2Semiconductor device and manufacturing method thereofRENESAS ELECTRONICS CORP·Filed 2016·Granted Jul 4, 2017·4 cites·6 claims
- 0381US8123901B2Etching apparatusINADA ATSURO·Filed 2005·Granted Feb 28, 2012·13 cites·19 claims
- 0475US9910219B2Semiconductor device and manufacturing method thereofRENESAS ELECTRONICS CORP·Filed 2016·Granted Mar 6, 2018·2 cites·7 claims
- 0575US9634009B1System and method for source-drain extension in FinFETsIBM·Filed 2015·Granted Apr 25, 2017·2 cites·17 claims
- 0674US2024413241A1Semiconductor device and method for manufacturing sameTOSHIBA KK·Filed 2024·Application pending·0 cites
- 0764US11715793B2Semiconductor device and method of manufacturing sameTOSHIBA KK·Filed 2021·Granted Aug 1, 2023·0 cites·9 claims
- 0861US12094968B2Semiconductor device and method for manufacturing sameTOSHIBA KK·Filed 2021·Granted Sep 17, 2024·0 cites·9 claims
- 0955US10038114B2Semiconductor device and manufacturing method thereofRENESAS ELECTRONICS CORP·Filed 2017·Granted Jul 31, 2018·0 cites·4 claims
- 1054US10267991B2Semiconductor device and manufacturing method thereofRENESAS ELECTRONICS CORP·Filed 2018·Granted Apr 23, 2019·0 cites·8 claims
- 1150US11640991B2Semiconductor device and method for manufacturing the sameTOSHIBA KK·Filed 2021·Granted May 2, 2023·0 cites·14 claims
- 1250US8492227B2Method of forming side wall spacers for a semiconductor deviceMITSUIKI AKIRA·Filed 2010·Granted Jul 23, 2013·1 cites·5 claims
- 1350US2023093365A1Semiconductor manufacturing apparatusTOSHIBA KK·Filed 2022·Application pending·0 cites
- 1444US10078182B2Semiconductor device and method for manufacturing the sameRENESAS ELECTRONICS CORP·Filed 2016·Granted Sep 18, 2018·0 cites·14 claims
- 1544US2008194107A1Method of manufacturing semiconductor deviceNEC ELECTRONICS CORP·Filed 2008·Application pending·0 cites
- 1640US2006086461A1Etching apparatus and etching methodNEC ELECTRONICS CORP·Filed 2005·Application pending·0 cites
- 1740US2014162447A1Finfet hybrid full metal gate with borderless contactsIBM·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →