Inventor · disambiguated record
Mitsuhiro Hata
Also filed as: HATA MITSUHIRO
17 granted patents·19 pending applications·108 citations·filing 2004–2011
92Inventor score
Files withSAMSUNG ELECTRONICS CO LTD14SUMITOMO CHEMICAL CO11HATA MITSUHIRO5ICHIKAWA KOJI2MASUYAMA TATSURO2
Top patents by PatentIndex Score
36 records- 0194US7361609B2Mask patterns for semiconductor device fabrication and related methodsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 22, 2008·27 cites·18 claims
- 0293US7855038B2Mask patterns for semiconductor device fabrication and related methods and structuresSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Dec 21, 2010·21 cites·7 claims
- 0389US7384730B2Top coating composition for photoresist and method of forming photoresist pattern using sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 10, 2008·13 cites·53 claims
- 0488US9063414B2Photoresist compositionICHIKAWA KOJI·Filed 2011·Granted Jun 23, 2015·6 cites·3 claims
- 0587US8048612B2Polymer and chemically amplified resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 2009·Granted Nov 1, 2011·10 cites·6 claims
- 0682US7604911B2Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Oct 20, 2009·5 cites·24 claims
- 0782US7314691B2Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jan 1, 2008·18 cites·40 claims
- 0877US7981985B2Polymer and chemically amplified resist composition comprising the sameSUMITOMO CHEMICAL CO·Filed 2009·Granted Jul 19, 2011·4 cites·6 claims
- 0971US8475999B2Compound and photoresist composition containing the sameMASUYAMA TATSURO·Filed 2010·Granted Jul 2, 2013·1 cites·5 claims
- 1069US7361612B2Barrier coating compositions containing silicon and methods of forming photoresist patterns using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 22, 2008·2 cites·22 claims
- 1157US7985529B2Mask patterns including gel layers for semiconductor device fabricationSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Jul 26, 2011·0 cites·15 claims
- 1255US8062829B2Chemically amplified resist composition and chemically amplified resist composition for immersion lithographyHATA MITSUHIRO·Filed 2009·Granted Nov 22, 2011·1 cites·12 claims
- 1353US8476473B2Compound, method for preparing the compound and resist composition containing the compoundTAKEMOTO ICHIKI·Filed 2009·Granted Jul 2, 2013·0 cites·3 claims
- 1452US2008305638A1Coating compositions for use in forming patterns and methods of forming patternsCHOI SANG-JUNG·Filed 2008·Application pending·0 cites
- 1549US2011183264A1Resist processing method and use of positive type resist compositionSUMITOMO CHEMICAL CO·Filed 2009·Application pending·0 cites
- 1649US2008113300A2Coating Compositions for Use in Forming Patterns and Methods of Forming PatternsSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1749US2006063077A1Mask patterns including gel layers for semiconductor device fabrication and methods of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 1848US7642042B2Polymer, top coating layer, top coating composition and immersion lithography process using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jan 5, 2010·0 cites·48 claims
- 1948US2011171586A1Resist processing methodSUMITOMO CHEMICAL CO·Filed 2009·Application pending·0 cites
- 2048US2011189618A1Resist processing methodSUMITOMO CHEMICAL CO·Filed 2009·Application pending·0 cites
- 2143US2007037068A1Barrier coating compositions for photoresist and methods of forming photoresist patterns using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2241US8546059B2Photoresist compositionICHIKAWA KOJI·Filed 2010·Granted Oct 1, 2013·0 cites·10 claims
- 2341US2010279226A1Resist processing methodHATA MITSUHIRO·Filed 2008·Application pending·0 cites
- 2441US2006111547A1Bottom layer resist polymers for photolithography and methods of manufacturing the sameHATA MITSUHIRO·Filed 2005·Application pending·0 cites
- 2541US2006127816A1Double photolithography methods with reduced intermixing of solventsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 2640US2011091820A1Resist processing methodHATA MITSUHIRO·Filed 2009·Application pending·0 cites
- 2739US2005227492A1Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 2838US2011039208A1Photoresist composition containing the sameSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 2938US2011091818A1Process for producing photoresist patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 3037US8900790B2Photoresist compositionMASUYAMA TATSURO·Filed 2010·Granted Dec 2, 2014·0 cites·5 claims
- 3137US2011165521A1Process for producing photoresist patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 3237US2010273112A1Process for producing photoresist patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 3337US2011065047A1Photoresist compositionSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 3436US2010273113A1Process for producing photoresist patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 3535US2006275697A1Top coating composition for photoresist and method of forming photoresist pattern using the sameHATA MITSUHIRO·Filed 2006·Application pending·0 cites
- 3632US7468235B2Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositionsSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Dec 23, 2008·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →