Inventor · disambiguated record
Roger F. Sinta
Also filed as: SINTA ROGER · SINTA ROGER F · SINTA ROGER S
46 granted patents·10 pending applications·1,338 citations·filing 1984–2019
98Inventor score
Files withSHIPLEY CO LLC31SHIPLEY CO6POLAROID CORP4KEMPUR MICROELECTRONICS INC2RAMIREZ AINISSA GWENETH2
Top patents by PatentIndex Score
56 records- 0197US5886102AAntireflective coating compositionsSHIPLEY CO LLC·Filed 1996·Granted Mar 23, 1999·238 cites·9 claims
- 0295US5128232APhotoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic unitsSHIPLY COMPANY INC·Filed 1989·Granted Jul 7, 1992·122 cites·19 claims
- 0393US6410209B1Methods utilizing antireflective coating compositions with exposure under 200 nmSHIPLEY CO LLC·Filed 1998·Granted Jun 25, 2002·108 cites·9 claims
- 0493US5731364APhotoimageable compositions comprising multiple arylsulfonium photoactive compoundsSHIPLEY CO LLC·Filed 1996·Granted Mar 24, 1998·70 cites·24 claims
- 0592US7632630B2Dyed photoresists and methods and articles of manufacture comprising sameROHM & HAAS ELECT MAT·Filed 2006·Granted Dec 15, 2009·17 cites·12 claims
- 0692US6602652B2Antireflective coating compositions and exposure methods under 200 nmSHIPLEY CO LLC·Filed 2002·Granted Aug 5, 2003·44 cites·19 claims
- 0789US5627010APhotoimageable resist compositions containing photobase generatorSHIPLEY CO LLC·Filed 1994·Granted May 6, 1997·65 cites·36 claims
- 0888US5344742ABenzyl-substituted photoactive compounds and photoresist compositions comprising sameSHIPLEY CO·Filed 1993·Granted Sep 6, 1994·78 cites·28 claims
- 0986US6048672APhotoresist compositions and methods and articles of manufacture comprising sameSHIPLEY CO LLC·Filed 1998·Granted Apr 11, 2000·61 cites·19 claims
- 1086US6033830AAntireflective coating compositionsSHIPLEY CO LLC·Filed 1997·Granted Mar 7, 2000·52 cites·14 claims
- 1186US5258257ARadiation sensitive compositions comprising polymer having acid labile groupsSHIPLEY CO·Filed 1991·Granted Nov 2, 1993·51 cites·34 claims
- 1279US5384229APhotoimageable compositions for electrodepositionSHIPLEY CO·Filed 1992·Granted Jan 24, 1995·34 cites·22 claims
- 1378US8945677B2Electronic device manufacture using low-k dielectric materialsZAFIROPOULOS NICHOLAS A·Filed 2012·Granted Feb 3, 2015·5 cites·18 claims
- 1477US6037107APhotoresist compositionsSHIPLEY CO LLC·Filed 1997·Granted Mar 14, 2000·30 cites·15 claims
- 1576US5362600ARadiation sensitive compositions comprising polymer having acid labile groupsSHIPLEY CO·Filed 1993·Granted Nov 8, 1994·27 cites·19 claims
- 1675US4608429ALow-melting aromatic polyesters with repeating 2,2'-substituted-biphenylene radicalsPOLAROID CORP PATENT DEPT·Filed 1984·Granted Aug 26, 1986·22 cites·22 claims
- 1772US5212046ANear UV photoresistSHIPLEY CO·Filed 1991·Granted May 18, 1993·35 cites·22 claims
- 1870US6107425ANarrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresistsSHIPLEY CO LLC·Filed 1998·Granted Aug 22, 2000·24 cites·28 claims
- 1970US5919597AMethods for preparing photoresist compositionsIBM CORP OF ARMONK·Filed 1997·Granted Jul 6, 1999·34 cites·28 claims
- 2066US6077643APolymers and photoresist compositionsSHIPLEY CO LLC·Filed 1997·Granted Jun 20, 2000·25 cites·6 claims
- 2166US5976770ADyed photoresists and methods and articles of manufacture comprising sameSHIPLEY CO LLC·Filed 1998·Granted Nov 2, 1999·21 cites·28 claims
- 2263US5210000APhotoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic unitsSHIPLEY CO·Filed 1992·Granted May 11, 1993·17 cites·20 claims
- 2361US5731386APolymer for positive acid catalyzed resistsSHIPLEY CO LLC·Filed 1995·Granted Mar 24, 1998·18 cites·7 claims
- 2460USRE38980EPhotoresist compositionsSHIPLEY CO LLC·Filed 2002·Granted Feb 14, 2006·4 cites·32 claims
- 2559US7026093B2Photoresist compositionsSHIPLEY CO LLC·Filed 2003·Granted Apr 11, 2006·5 cites·3 claims
- 2658US5900346ACompositions comprising photoactivator, acid, generator and chain extenderSHIPLEY CO LLC·Filed 1997·Granted May 4, 1999·18 cites·23 claims
- 2757US6794109B2Low abosorbing resists for 157 nm lithographyMASSACHUSETTS INST TECHNOLOGY·Filed 2001·Granted Sep 21, 2004·4 cites·36 claims
- 2854US2015145106A1ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALSASPEN AEROGELS INC·Filed 2014·Application pending·0 cites
- 2952US5641604APhotoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethersSHIPLEY CO LLC·Filed 1996·Granted Jun 24, 1997·11 cites·16 claims
- 3052US5541263APolymer having inert blocking groupsSHIPLEY CO LLC·Filed 1995·Granted Jul 30, 1996·18 cites·5 claims
- 3151US6645698B1Photoresist compositionsSHIPLEY CO LLC·Filed 1999·Granted Nov 11, 2003·9 cites·17 claims
- 3251US5827634APositive acid catalyzed resistsSHIPLEY CO LLC·Filed 1997·Granted Oct 27, 1998·14 cites·11 claims
- 3348US6706461B1Dyed photoresists and methods and articles of manufacture comprising sameSHIPLEY CO LLC·Filed 1999·Granted Mar 16, 2004·9 cites·22 claims
- 3448US5514520ARadiation sensitive composition comprising polymer having inert blocking groupsSHIPLEY CO LLC·Filed 1995·Granted May 7, 1996·14 cites·19 claims
- 3546US7482107B2Photoresist compositionSHIPLEY CO LLC·Filed 2006·Granted Jan 27, 2009·2 cites·10 claims
- 3644US4857227ALiquid crystal mixtures having widened smectic temperature rangePOLAROID CORP·Filed 1987·Granted Aug 15, 1989·7 cites·9 claims
- 3744US2009014746A1Solder alloysRAMIREZ AINISSA GWENETH·Filed 2007·Application pending·0 cites
- 3844US2007292072A1Solder alloysRAMIREZ AINISSA GWENETH·Filed 2006·Application pending·0 cites
- 3942US5858605AAcid labile photoactive compositionSHIPLEY CO LLC·Filed 1997·Granted Jan 12, 1999·6 cites·11 claims
- 4042US4792597AMelt-processable polyesteramides having para-linked, substituted-phenylene radicalsPOLAROID CORP·Filed 1987·Granted Dec 20, 1988·4 cites·11 claims
- 4138US9766542B2Negative chemically-amplified photoresist and imaging method thereofKEMPUR MICROELECTRONICS INC·Filed 2013·Granted Sep 19, 2017·0 cites·18 claims
- 4237US6770413B1Hydroxyphenyl copolymers and photoresists comprising sameSHIPLEY CO LLC·Filed 1999·Granted Aug 3, 2004·4 cites·10 claims
- 4337US4575547ALow-melting aromatic polyesters of trifluoromethyl terephthalic acid or ester forming derivatives thereofPOLAROID CORP·Filed 1984·Granted Mar 11, 1986·3 cites·16 claims
- 4437US2016238945A1Novel photoresist stripper and application process thereofKEMPUR MICROELECTRONICS INC·Filed 2013·Application pending·0 cites
- 4535US5700624APositive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groupsSHIPLEY CO LLC·Filed 1995·Granted Dec 23, 1997·4 cites·13 claims
- 4635US4843141AMelt-processable aromatic polyesteramide having repeating 2,2'-substituted biphenylene radicalsPOLAROID CORP·Filed 1987·Granted Jun 27, 1989·2 cites·23 claims
- 4735US2009220888A1Dyed photoresists and methods and articles of manufacture comprising sameSHIPLEY CO LLC·Filed 2008·Application pending·0 cites
- 4835US2002012869A1Positive photoresists containing crosslinked polymersSHIPLEY CO LLC·Filed 2001·Application pending·0 cites
- 4935US2019339613A1Photosensitive Material For Lift-Off ApplicationsGOLDEN JEREMY·Filed 2019·Application pending·0 cites
- 5034US2003073042A1Process and materials for formation of patterned films of functional materialsFiled 2001·Application pending·0 cites
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