Inventor · disambiguated record
Quanyuan Shang
Also filed as: SHANG QUAN YUAN · SHANG QUANYUAN · SHANG QUANYUAN T
57 granted patents·48 pending applications·4,711 citations·filing 1996–2011
99Inventor score
Files withAPPLIED MATERIALS INC68APPLIED KOMATSU TECHNOLOGY INC10SHANG QUANYUAN8WHITE JOHN M4KURITA SHINICHI2
Top patents by PatentIndex Score
105 records- 0199US6825134B2Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flowAPPLIED MATERIALS INC·Filed 2002·Granted Nov 30, 2004·595 cites·33 claims
- 0299US6772827B2Suspended gas distribution manifold for plasma chamberAPPLIED MATERIALS INC·Filed 2001·Granted Aug 10, 2004·301 cites·24 claims
- 0399US6182603B1Surface-treated shower head for use in a substrate processing chamberAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Feb 6, 2001·692 cites·6 claims
- 0498US7484473B2Suspended gas distribution manifold for plasma chamberAPPLIED MATERIALS INC·Filed 2004·Granted Feb 3, 2009·238 cites·6 claims
- 0598US6942753B2Gas distribution plate assembly for large area plasma enhanced chemical vapor depositionAPPLIED MATERIALS INC·Filed 2003·Granted Sep 13, 2005·810 cites·23 claims
- 0698US6432255B1Method and apparatus for enhancing chamber cleaningAPPLIED MATERIALS INC·Filed 2000·Granted Aug 13, 2002·436 cites·12 claims
- 0798US5788778ADeposition chamber cleaning technique using a high power remote excitation sourceAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Aug 4, 1998·281 cites·21 claims
- 0897US7358192B2Method and apparatus for in-situ film stack processingAPPLIED MATERIALS INC·Filed 2004·Granted Apr 15, 2008·174 cites·31 claims
- 0995US8449950B2In-situ deposition of battery active lithium materials by plasma sprayingSHANG QUANYUAN·Filed 2010·Granted May 28, 2013·28 cites·11 claims
- 1095US6857387B1Multiple frequency plasma chamber with grounding capacitor at cathodeAPPLIED MATERIALS INC·Filed 2000·Granted Feb 22, 2005·92 cites·33 claims
- 1195US6055927AApparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technologyAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted May 2, 2000·129 cites·15 claims
- 1295US6024044ADual frequency excitation of plasma for film depositionAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Feb 15, 2000·184 cites·7 claims
- 1394US7611217B2Methods and systems for inkjet drop positioningAPPLIED MATERIALS INC·Filed 2005·Granted Nov 3, 2009·23 cites·12 claims
- 1493US6647993B2Surface-treated shower head for use in a substrate processing chamberAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Nov 18, 2003·48 cites·3 claims
- 1591US6676761B2Method and apparatus for dechucking a substrateAPPLIED MATERIALS INC·Filed 2002·Granted Jan 13, 2004·45 cites·29 claims
- 1691US6355108B1Film deposition using a finger type shadow frameAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Mar 12, 2002·90 cites·27 claims
- 1790US7413272B2Methods and apparatus for precision control of print head assembliesAPPLIED MATERIALS INC·Filed 2005·Granted Aug 19, 2008·13 cites·17 claims
- 1889US6765178B2Chamber for uniform substrate heatingAPPLIED MATERIALS INC·Filed 2001·Granted Jul 20, 2004·37 cites·29 claims
- 1988US7160392B2Method for dechucking a substrateAPPLIED MATERIALS INC·Filed 2003·Granted Jan 9, 2007·33 cites·8 claims
- 2088US6887776B2Methods to form metal lines using selective electrochemical depositionAPPLIED MATERIALS INC·Filed 2003·Granted May 3, 2005·42 cites·22 claims
- 2185US6869838B2Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applicationsAPPLIED MATERIALS INC·Filed 2002·Granted Mar 22, 2005·35 cites·14 claims
- 2284US6902682B2Method and apparatus for electrostatically maintaining substrate flatnessAPPLIED MATERIALS INC·Filed 2002·Granted Jun 7, 2005·21 cites·15 claims
- 2383US7022948B2Chamber for uniform substrate heatingAPPLIED MATERIALS INC·Filed 2004·Granted Apr 4, 2006·23 cites·11 claims
- 2482US6880561B2Fluorine process for cleaning semiconductor process chamberAPPLIED MATERIALS INC·Filed 2003·Granted Apr 19, 2005·23 cites·12 claims
- 2582US5892328AHigh-power, plasma-based, reactive species generatorAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Apr 6, 1999·37 cites·23 claims
- 2681US7556334B2Methods and apparatus for aligning print headsAPPLIED MATERIALS INC·Filed 2004·Granted Jul 7, 2009·15 cites·18 claims
- 2781US7086918B2Low temperature process for passivation applicationsAPPLIED MATERIALS INC·Filed 2002·Granted Aug 8, 2006·34 cites·29 claims
- 2880US8617350B2Linear plasma systemSHANG QUANYUAN T·Filed 2011·Granted Dec 31, 2013·3 cites·14 claims
- 2979US7029529B2Method and apparatus for metallization of large area substratesAPPLIED MATERIALS INC·Filed 2002·Granted Apr 18, 2006·21 cites·47 claims
- 3079US6500265B1Apparatus for electrostatically maintaining subtrate flatnessAPPLIED MATERIALS INC·Filed 2000·Granted Dec 31, 2002·16 cites·23 claims
- 3178US7732010B2Method for supporting a glass substrate to improve uniform deposition thicknessAPPLIED MATERIALS INC·Filed 2006·Granted Jun 8, 2010·1 cites·8 claims
- 3278US6468601B1Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technologyAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Oct 22, 2002·14 cites·14 claims
- 3376US7915114B2Low temperature process for TFT fabricationAPPLIED MATERIALS INC·Filed 2007·Granted Mar 29, 2011·6 cites·22 claims
- 3475US7460267B2Green printing ink for color filter applicationsAPPLIED MATERIALS INC·Filed 2005·Granted Dec 2, 2008·2 cites·23 claims
- 3574US7439191B2Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applicationsAPPLIED MATERIALS INC·Filed 2002·Granted Oct 21, 2008·18 cites·72 claims
- 3673US8399065B2In-situ deposition of battery active lithium materials by thermal sprayingSHANG QUANYUAN·Filed 2010·Granted Mar 19, 2013·1 cites·15 claims
- 3773US8002896B2Shadow frame with cross beam for semiconductor equipmentAPPLIED MATERIALS INC·Filed 2005·Granted Aug 23, 2011·1 cites·12 claims
- 3873US6960263B2Shadow frame with cross beam for semiconductor equipmentAPPLIED MATERIALS INC·Filed 2002·Granted Nov 1, 2005·10 cites·14 claims
- 3972US7637580B2Methods and apparatus for a high resolution inkjet fire pulse generatorAPPLIED MATERIALS INC·Filed 2005·Granted Dec 29, 2009·2 cites·18 claims
- 4070US7199061B2Pecvd silicon oxide thin film depositionAPPLIED MATERIALS INC·Filed 2003·Granted Apr 3, 2007·12 cites·19 claims
- 4168US6610354B2Plasma display panel with a low k dielectric layerAPPLIED MATERIALS INC·Filed 2001·Granted Aug 26, 2003·6 cites·37 claims
- 4267US8372205B2Reducing electrostatic charge by roughening the susceptorAPPLIED MATERIALS INC·Filed 2005·Granted Feb 12, 2013·2 cites·25 claims
- 4366US5895548AHigh power microwave plasma applicatorAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Apr 20, 1999·18 cites·31 claims
- 4465US7625063B2Apparatus and methods for an inkjet head support having an inkjet head capable of independent lateral movementAPPLIED MATERIALS INC·Filed 2004·Granted Dec 1, 2009·6 cites·19 claims
- 4565US6863077B2Method and apparatus for enhanced chamber cleaningAPPLIED MATERIALS INC·Filed 2002·Granted Mar 8, 2005·8 cites·8 claims
- 4665US6843258B2On-site cleaning gas generation for process chamber cleaningAPPLIED MATERIALS INC·Filed 2000·Granted Jan 18, 2005·17 cites·20 claims
- 4763US7031600B2Method and apparatus for silicon oxide deposition on large area substratesAPPLIED MATERIALS INC·Filed 2003·Granted Apr 18, 2006·4 cites·17 claims
- 4863US6177023B1Method and apparatus for electrostatically maintaining substrate flatnessAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Jan 23, 2001·19 cites·16 claims
- 4959US7681986B2Methods and apparatus for depositing ink onto substratesAPPLIED MATERIALS INC·Filed 2007·Granted Mar 23, 2010·1 cites·21 claims
- 5058US6858548B2Application of carbon doped silicon oxide film to flat panel industryAPPLIED MATERIALS INC·Filed 2002·Granted Feb 22, 2005·7 cites·28 claims
Showing the top 50 of 105 patent records by PatentIndex Score.
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