Inventor · disambiguated record
William Baggenstoss
Also filed as: BAGGENSTOSS WILLIAM · BAGGENSTOSS WILLIAM J
10 granted patents·1 pending application·251 citations·filing 1998–2005
89Inventor score
Top patents by PatentIndex Score
11 records- 0197US6120952AMethods of reducing proximity effects in lithographic processesMICRON TECHNOLOGY INC·Filed 1998·Granted Sep 19, 2000·155 cites·35 claims
- 0289US6319644B2Methods of reducing proximity effects in lithographic processesMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 20, 2001·29 cites·38 claims
- 0389US6284419B2Methods of reducing proximity effects in lithographic processesMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 4, 2001·29 cites·38 claims
- 0467US7880255B2Pixel cell having a grated interfaceMICRON TECHNOLOGY INC·Filed 2004·Granted Feb 1, 2011·11 cites·37 claims
- 0565US8101454B2Method of forming pixel cell having a grated interfaceBAGGENSTOSS WILLIAM J·Filed 2005·Granted Jan 24, 2012·2 cites·34 claims
- 0662US6401236B1Method to eliminate side lobe printing of attenuated phase shiftMICRON TECHNOLOGY INC·Filed 1999·Granted Jun 4, 2002·21 cites·52 claims
- 0755US6854106B2Reticles and methods of forming and using the sameMICRON TECHNOLOGY INC·Filed 2002·Granted Feb 8, 2005·3 cites·89 claims
- 0850US2006093927A1Pattern mask with features to minimize the effect of aberrationsBALUSWAMY PARY·Filed 2005·Application pending·0 cites
- 0947US6803157B2Pattern mask with features to minimize the effect of aberrationsMICRON TECHNOLOGY INC·Filed 2002·Granted Oct 12, 2004·1 cites·10 claims
- 1044US7229724B2Reticles and methods of forming and using the sameMICRON TECHNOLOGY INC·Filed 2004·Granted Jun 12, 2007·0 cites·54 claims
- 1144US7105278B2Pattern mask with features to minimize the effect of aberrationsMICRON TECHNOLOGY INC·Filed 2004·Granted Sep 12, 2006·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →