Inventor · disambiguated record
Rene Monshouwer
Also filed as: MONSHOUWER RENE
10 granted patents·111 citations·filing 2001–2008
88Inventor score
Top patents by PatentIndex Score
10 records- 0190US7277185B2Method of measuring overlayASML NETHERLANDS BV·Filed 2005·Granted Oct 2, 2007·12 cites·7 claims
- 0290US6937344B2Method of measuring overlayASML NETHERLANDS BV·Filed 2001·Granted Aug 30, 2005·36 cites·14 claims
- 0388US6937334B2Method of measuring alignment of a substrate with respect to a reference alignment markASML NETHERLANDS BV·Filed 2001·Granted Aug 30, 2005·29 cites·10 claims
- 0477US7095499B2Method of measuring alignment of a substrate with respect to a reference alignment markASML NETHERLANDS BV·Filed 2005·Granted Aug 22, 2006·4 cites·11 claims
- 0570US7633618B2Method and apparatus for measuring the relative position of a first and a second alignment markASML NETHERLANDS BV·Filed 2004·Granted Dec 15, 2009·18 cites·17 claims
- 0666US7345739B2Lithographic alignment system and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Mar 18, 2008·8 cites·20 claims
- 0757US6803993B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2002·Granted Oct 12, 2004·4 cites·14 claims
- 0856US8264664B2Method for producing a marker on a substrate, lithographic apparatus and device manufacturing methodVAN DER SCHAAR MAURITS·Filed 2008·Granted Sep 11, 2012·0 cites·10 claims
- 0944US7476490B2Method for producing a marker on a substrate, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jan 13, 2009·0 cites·14 claims
- 1043US7312846B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 25, 2007·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →