Inventor · disambiguated record
Isamu Seto
Also filed as: SETO ISAMU
10 granted patents·1 pending application·194 citations·filing 1995–2014
91Inventor score
Top patents by PatentIndex Score
11 records- 0184US6242751B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1999·Granted Jun 5, 2001·33 cites·62 claims
- 0283US5719402AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 17, 1998·32 cites·11 claims
- 0379US5757015ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1996·Granted May 26, 1998·25 cites·22 claims
- 0476US5546319AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1995·Granted Aug 13, 1996·21 cites·34 claims
- 0575US5969365ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·20 cites·18 claims
- 0669US5721432AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 24, 1998·16 cites·5 claims
- 0768US6399954B1Charged-particle beam lithography apparatus and system capable of readily detecting abnormality in controlling on-off operationADVANTEST CORP·Filed 1999·Granted Jun 4, 2002·21 cites·12 claims
- 0865US5965895AMethod of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposureFUJITSU LTD·Filed 1997·Granted Oct 12, 1999·13 cites·9 claims
- 0945US8624205B2Charged particle beam writing apparatus and device production methodSETO ISAMU·Filed 2010·Granted Jan 7, 2014·1 cites·5 claims
- 1044US6407397B1Charged particle beam exposure apparatusADVANTEST CORP·Filed 1999·Granted Jun 18, 2002·12 cites·4 claims
- 1143US2015044615A1Drawing data generating method, processing apparatus, storage medium, drawing apparatus, and method of manufacturing articleCANON KK·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →