Inventor · disambiguated record
Ko Miyazaki
Also filed as: MIYAZAKI KO
13 granted patents·3 pending applications·149 citations·filing 1991–2008
92Inventor score
Top patents by PatentIndex Score
16 records- 0193US6656644B2Manufacturing method of photomask and photomaskHITACHI LTD·Filed 2001·Granted Dec 2, 2003·64 cites·23 claims
- 0283US6665858B2Manufacturing method of semiconductor deviceHITACHI LTD·Filed 2001·Granted Dec 16, 2003·31 cites·7 claims
- 0371US6596656B2Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NMHITACHI LTD·Filed 2001·Granted Jul 22, 2003·11 cites·27 claims
- 0461US6846598B2Manufacturing method of photomask and photomaskHITACHI LTD·Filed 2003·Granted Jan 25, 2005·6 cites·1 claims
- 0559US6958292B2Method of manufacturing integrated circuitRENESAS TECH CORP·Filed 2003·Granted Oct 25, 2005·4 cites·8 claims
- 0656US6794207B2Method of manufacturing integrated circuitRENESAS TECH CORP·Filed 2003·Granted Sep 21, 2004·3 cites·10 claims
- 0755US7361530B2Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking lightRENESAS TECH CORP·Filed 2007·Granted Apr 22, 2008·3 cites·11 claims
- 0855US6902868B2Method of manufacturing integrated circuitRENESAS TECH CORP·Filed 2001·Granted Jun 7, 2005·3 cites·15 claims
- 0952US6936406B2Method of manufacturing integrated circuitRENESAS TECH CORP·Filed 2003·Granted Aug 30, 2005·2 cites·4 claims
- 1049US7205222B2Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking lightRENESAS TECH CORP·Filed 2004·Granted Apr 17, 2007·1 cites·15 claims
- 1149US6622292B2Design method for logic circuit, design support system for logic circuit and readable mediaHITACHI LTD·Filed 2001·Granted Sep 16, 2003·4 cites·24 claims
- 1245US2009039520A1Semiconductor circuit device, wiring method for semiconductor circuit device and data processing systemRENESAS TECH CORP·Filed 2008·Application pending·0 cites
- 1342US2003207521A1Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 nmHITACHI LTD·Filed 2003·Application pending·0 cites
- 1439US6849540B2Method of fabricating semiconductor integrated circuit device and method of producing a multi-chip module that includes patterning with a photomask that uses metal for blocking exposure light and a photomask that uses organic resin for blocking exposure lightRENESAS TECH CORP·Filed 2001·Granted Feb 1, 2005·2 cites·29 claims
- 1539US5159664AGraphic display apparatusHITACHI LTD·Filed 1991·Granted Oct 27, 1992·15 cites·13 claims
- 1636US2002042007A1Fabrication method of semiconductor integrated circuit deviceFiled 2001·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →