Inventor · disambiguated record
Jinho Ahn
Also filed as: AHN JINHO
6 granted patents·5 pending applications·10 citations·filing 2015–2023
72Inventor score
Files withIUCF HYU5UNIV HANYANG IND UNIV COOP FOUND3SAMSUNG ELECTRONICS CO LTD2INDUSTRY UNIV COOPERATION FOUNDATION HANYANG UNIV IUCF HYU1
Top patents by PatentIndex Score
11 records- 0187US9958770B2Pellicle for EUV lithographyUNIV HANYANG IND UNIV COOP FOUND·Filed 2015·Granted May 1, 2018·8 cites·18 claims
- 0269US11940726B2Mask protective module, pellicle having the same, and lithography apparatus having the sameUNIV HANYANG IND UNIV COOP FOUND·Filed 2022·Granted Mar 26, 2024·0 cites·4 claims
- 0363US9506089B2Microorganism having novel acrylic acid synthesis pathway and method of producing acrylic acid by using the microorganismSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Nov 29, 2016·1 cites·13 claims
- 0463US2025334514A1Euv mask inspection apparatus and method through illumination controlIUCF HYU·Filed 2023·Application pending·0 cites
- 0562US10061190B2Mask for extreme ultraviolet lithography process and method of fabricating the sameINDUSTRY UNIV COOPERATION FOUNDATION HANYANG UNIV IUCF HYU·Filed 2015·Granted Aug 28, 2018·1 cites·19 claims
- 0662US2025231494A1Comprehensive inspection equipment for euv exposure processIUCF HYU·Filed 2023·Application pending·0 cites
- 0762US2024061330A1Multi-layered molecular film photoresist having molecular line structure and method for manufacturing sameIUCF HYU·Filed 2023·Application pending·0 cites
- 0861US12032281B2Pellicle cleaning apparatus and pellicle cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 9, 2024·0 cites·14 claims
- 0960US2025321186A1Device and method for measuring refraction coefficient and extinction coefficient of euv mask materialIUCF HYU·Filed 2023·Application pending·0 cites
- 1058US11402746B2Mask protective module, pellicle having the same, and lithography apparatus having the sameUNIV HANYANG IND UNIV COOP FOUND·Filed 2019·Granted Aug 2, 2022·0 cites·15 claims
- 1148US2021397078A1Mask for extreme ultraviolet lithography and method for manufacturing sameIUCF HYU·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →