Inventor · disambiguated record
Wataru Nihashi
Also filed as: NIHASHI WATARU
23 granted patents·10 pending applications·48 citations·filing 2014–2021
92Inventor score
Files withFUJIFILM CORP33
Top patents by PatentIndex Score
33 records- 0196US11156915B2Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Oct 26, 2021·7 cites·12 claims
- 0295US9291896B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·20 claims
- 0393US9527809B2Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Dec 27, 2016·6 cites·12 claims
- 0491US10663864B2Pattern forming method, method for manufacturing electronic device, and laminateFUJIFILM CORP·Filed 2018·Granted May 26, 2020·4 cites·11 claims
- 0591US9291898B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·19 claims
- 0688US9291897B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·3 cites·11 claims
- 0784US9651863B2Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted May 16, 2017·2 cites·22 claims
- 0882US10788754B2Pattern forming method and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Sep 29, 2020·2 cites·13 claims
- 0980US9423690B2Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the sameFUJIFILM CORP·Filed 2015·Granted Aug 23, 2016·3 cites·14 claims
- 1077US11042094B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2018·Granted Jun 22, 2021·1 cites·10 claims
- 1173US10890847B2Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Jan 12, 2021·1 cites·13 claims
- 1271US10761426B2Pattern forming method, method for manufacturing electronic device, and laminateFUJIFILM CORP·Filed 2018·Granted Sep 1, 2020·1 cites·11 claims
- 1368US10444627B2Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Oct 15, 2019·1 cites·19 claims
- 1467US10095111B2Pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2017·Granted Oct 9, 2018·1 cites·14 claims
- 1566US12306538B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2021·Granted May 20, 2025·0 cites·5 claims
- 1658US10962884B2Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2018·Granted Mar 30, 2021·0 cites·8 claims
- 1757US10562991B2Developer, pattern forming method, and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Feb 18, 2020·0 cites·14 claims
- 1856US10599038B2Rinsing liquid, pattern forming method, and electronic device manufacturing methodFUJIFILM CORP·Filed 2017·Granted Mar 24, 2020·0 cites·8 claims
- 1952US11573491B2Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Feb 7, 2023·0 cites·20 claims
- 2048US2021200098A1Pattern forming method and resist laminate for organic solvent developmentFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 2147US2019276575A1Method for producing resin and method for producing actinic ray-sensitive or radiation-sensitive compositionFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 2246US2014363758A1Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2346US2019219922A1Resist composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 2444US2019187558A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 2543US11460769B2Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Oct 4, 2022·0 cites·21 claims
- 2643US10394127B2Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Aug 27, 2019·0 cites·12 claims
- 2743US2019018317A1Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Application pending·0 cites
- 2842US11640113B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Granted May 2, 2023·0 cites·11 claims
- 2942US9551933B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Jan 24, 2017·0 cites·24 claims
- 3041US2018321589A1Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Application pending·0 cites
- 3141US2018267404A1Pattern forming method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Application pending·0 cites
- 3239US2018101100A1Treatment liquid and pattern forming methodFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 3334US2015147688A1Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →