Inventor · disambiguated record
Douglas Keil
Also filed as: KEIL DOUGLAS · KEIL DOUGLAS L
54 granted patents·6 pending applications·866 citations·filing 1998–2023
98Inventor score
Top patents by PatentIndex Score
60 records- 0198US9449795B2Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactorNOVELLUS SYSTEMS INC·Filed 2013·Granted Sep 20, 2016·398 cites·22 claims
- 0296US10665429B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2017·Granted May 26, 2020·6 cites·20 claims
- 0396US9793096B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2015·Granted Oct 17, 2017·16 cites·18 claims
- 0496US9644271B1Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabricationLAM RES CORP·Filed 2016·Granted May 9, 2017·21 cites·24 claims
- 0596US7413672B1Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangementLAM RES CORP·Filed 2006·Granted Aug 19, 2008·46 cites·44 claims
- 0695US10287683B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionLAM RES CORP·Filed 2016·Granted May 14, 2019·6 cites·14 claims
- 0794US10224182B2Mechanical suppression of parasitic plasma in substrate processing chamberKEIL DOUGLAS·Filed 2011·Granted Mar 5, 2019·17 cites·21 claims
- 0894US10128160B2Systems and methods for detection of plasma instability by electrical measurementLAM RES CORP·Filed 2017·Granted Nov 13, 2018·6 cites·20 claims
- 0994US10121708B2Systems and methods for detection of plasma instability by optical diagnosisLAM RES CORP·Filed 2016·Granted Nov 6, 2018·7 cites·17 claims
- 1094US9388494B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionNOVELLUS SYSTEMS INC·Filed 2012·Granted Jul 12, 2016·16 cites·16 claims
- 1193US7994794B2Methods for measuring a set of electrical characteristics in a plasmaLAM RES CORP·Filed 2010·Granted Aug 9, 2011·15 cites·34 claims
- 1292US7578301B2Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing systemLAM RES CORP·Filed 2005·Granted Aug 25, 2009·14 cites·4 claims
- 1392US7479207B2Adjustable height PIF probeLAM RES CORP·Filed 2006·Granted Jan 20, 2009·17 cites·20 claims
- 1491US11725282B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionNOVELLUS SYSTEMS INC·Filed 2021·Granted Aug 15, 2023·1 cites·12 claims
- 1591US9129779B2Processing system for detecting in-situ arcing events during substrate processingBOOTH JEAN-PAUL·Filed 2012·Granted Sep 8, 2015·9 cites·20 claims
- 1691US7829468B2Method and apparatus to detect fault conditions of plasma processing reactorLAM RES CORP·Filed 2006·Granted Nov 9, 2010·22 cites·15 claims
- 1789US11111581B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionLAM RES CORP·Filed 2019·Granted Sep 7, 2021·3 cites·9 claims
- 1888US6630407B2Plasma etching of organic antireflective coatingLAM RES CORP·Filed 2001·Granted Oct 7, 2003·58 cites·20 claims
- 1987US12308216B2Mechanical suppression of parasitic plasma in substrate processing chamberLAM RES CORP·Filed 2023·Granted May 20, 2025·0 cites·20 claims
- 2087US11393729B2Systems and methods for controlling plasma instability in semiconductor fabricationLAM RES CORP·Filed 2019·Granted Jul 19, 2022·2 cites·20 claims
- 2187US9824941B2Systems and methods for detection of plasma instability by electrical measurementLAM RES CORP·Filed 2016·Granted Nov 21, 2017·3 cites·21 claims
- 2287US7319316B2Apparatus for measuring a set of electrical characteristics in a plasmaLAM RES CORP·Filed 2005·Granted Jan 15, 2008·8 cites·22 claims
- 2386US8179152B2Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted May 15, 2012·8 cites·13 claims
- 2485US7723994B2Plasma processing chamber with an apparatus for measuring a set of electrical characteristics in a plasmaLAM RES CORP·Filed 2007·Granted May 25, 2010·16 cites·22 claims
- 2584US11862435B2Mechanical suppression of parasitic plasma in substrate processing chamberLAM RES CORP·Filed 2023·Granted Jan 2, 2024·0 cites·12 claims
- 2683US10510625B2Systems and methods for controlling plasma instability in semiconductor fabricationLAM RES CORP·Filed 2016·Granted Dec 17, 2019·2 cites·20 claims
- 2783US9997422B2Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instabilityLAM RES CORP·Filed 2016·Granted Jun 12, 2018·2 cites·20 claims
- 2883US9153421B2Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2012·Granted Oct 6, 2015·5 cites·20 claims
- 2983US7347915B1Plasma in-situ treatment of chemically amplified resistLAM RES CORP·Filed 2006·Granted Mar 25, 2008·8 cites·9 claims
- 3082US9111724B2Apparatus and method for controlling plasma potentialKEIL DOUGLAS·Filed 2010·Granted Aug 18, 2015·5 cites·18 claims
- 3179US7867355B2Adjustable height PIF probeLAM RES CORP·Filed 2008·Granted Jan 11, 2011·5 cites·20 claims
- 3276US10475627B2Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignitionLAM RES CORP·Filed 2016·Granted Nov 12, 2019·3 cites·18 claims
- 3376US8159233B2Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Apr 17, 2012·6 cites·20 claims
- 3475US8164349B2Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereofBOOTH JEAN-PAUL·Filed 2009·Granted Apr 24, 2012·8 cites·20 claims
- 3574US7838086B2Magnetic enhancement for mechanical confinement of plasmaLAM RES CORP·Filed 2008·Granted Nov 23, 2010·3 cites·7 claims
- 3674US6780569B1Post-development treatment of patterned photoresist to promote cross-linking of polymer chainsLAM RES CORP·Filed 2002·Granted Aug 24, 2004·13 cites·18 claims
- 3773US7022611B1Plasma in-situ treatment of chemically amplified resistLAM RES CORP·Filed 2003·Granted Apr 4, 2006·14 cites·4 claims
- 3870US8780522B2Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereofBOOTH JEAN-PAUL·Filed 2009·Granted Jul 15, 2014·3 cites·20 claims
- 3969US11127567B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2020·Granted Sep 21, 2021·0 cites·24 claims
- 4068US8518209B2Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing systemHUDSON ERIC·Filed 2009·Granted Aug 27, 2013·1 cites·17 claims
- 4168US6540885B1Profile control of oxide trench features for dual damascene applicationsLAM RES CORP·Filed 2001·Granted Apr 1, 2003·14 cites·21 claims
- 4268US6217786B1Mechanism for bow reduction and critical dimension control in etching silicon dioxide using hydrogen-containing additive gases in fluorocarbon gas chemistryLAM RES CORP·Filed 1998·Granted Apr 17, 2001·36 cites·32 claims
- 4367US7455748B2Magnetic enhancement for mechanical confinement of plasmaLAM RES CORP·Filed 2003·Granted Nov 25, 2008·9 cites·17 claims
- 4466US11621150B2Mechanical suppression of parasitic plasma in substrate processing chamberLAM RES CORP·Filed 2019·Granted Apr 4, 2023·0 cites·19 claims
- 4565US10876209B2Systems and methods for determining film thickness using DC self-bias voltageNOVELLUS SYSTEMS INC·Filed 2019·Granted Dec 29, 2020·0 cites·7 claims
- 4664US8547085B2Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Oct 1, 2013·4 cites·4 claims
- 4761US8164353B2RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Apr 24, 2012·1 cites·20 claims
- 4860US8849585B2Methods for automatically characterizing a plasmaKEIL DOUGLAS·Filed 2009·Granted Sep 30, 2014·1 cites·9 claims
- 4957US10378109B2Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltageNOVELLUS SYSTEMS INC·Filed 2016·Granted Aug 13, 2019·0 cites·7 claims
- 5057US9404183B2Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltageNOVELLUS SYSTEMS INC·Filed 2013·Granted Aug 2, 2016·0 cites·18 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →