Inventor · disambiguated record
Toshihiko Minami
Also filed as: MINAMI TOSHIHIKO
7 granted patents·1 pending application·301 citations·filing 1985–2009
87Inventor score
Top patents by PatentIndex Score
8 records- 0191US5338363AChemical vapor deposition method, and chemical vapor deposition treatment system and chemical vapor deposition apparatus thereforMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Aug 16, 1994·113 cites·21 claims
- 0291US4894510AApparatus for uniformly distributing plasma over a substrateMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Jan 16, 1990·58 cites·22 claims
- 0390US4947085APlasma processorMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Aug 7, 1990·48 cites·10 claims
- 0468US5077238AMethod of manufacturing a semiconductor device with a planar interlayer insulating filmMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Dec 31, 1991·37 cites·13 claims
- 0560US5425812AReaction chamber for a chemical vapor deposition apparatus and a chemical vapor deposition apparatus using such a reaction chamberMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Jun 20, 1995·39 cites·7 claims
- 0644US4669071APhoto sensor device and optical pickup deviceSONY CORP·Filed 1985·Granted May 26, 1987·6 cites·21 claims
- 0742US8338298B2Method and apparatus for manufacturing semiconductor integrated circuit deviceFUJII KAZUYUKI·Filed 2009·Granted Dec 25, 2012·0 cites·10 claims
- 0839US2003094134A1Semiconductor manufacturing system with exhaust pipe, deposit elimination method for use with semiconductor manufacturing system, and method of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Toshihiko Minami files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →