Inventor · disambiguated record
Motosuke Miyoshi
Also filed as: MIYOSHI MOTOSUKE
48 granted patents·1,990 citations·filing 1983–2008
99Inventor score
Top patents by PatentIndex Score
48 records- 0197US6563308B2Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded mediumTOSHIBA KK·Filed 2001·Granted May 13, 2003·144 cites·47 claims
- 0297US5576833AWafer pattern defect detection method and apparatus thereforTOSHIBA KK·Filed 1995·Granted Nov 19, 1996·176 cites·11 claims
- 0396US6265719B1Inspection method and apparatus using electron beamTOSHIBA KK·Filed 1998·Granted Jul 24, 2001·121 cites·15 claims
- 0496US6038018ASubstrate inspecting apparatus, substrate inspecting system having the same apparatus and substrate inspecting methodTOSHIBA KK·Filed 1999·Granted Mar 14, 2000·124 cites·16 claims
- 0596US5429730AMethod of repairing defect of structureTOSHIBA KK·Filed 1993·Granted Jul 4, 1995·114 cites·54 claims
- 0695US4912052AMethod of testing semiconductor elementsTOSHIBA KK·Filed 1988·Granted Mar 27, 1990·85 cites·10 claims
- 0794US6563114B1Substrate inspecting system using electron beam and substrate inspecting method using electron beamTOSHIBA KK·Filed 2000·Granted May 13, 2003·103 cites·21 claims
- 0894US6259094B1Electron beam inspection method and apparatusTOSHIBA KK·Filed 1998·Granted Jul 10, 2001·92 cites·6 claims
- 0993US7649980B2X-ray sourceUNIV TOKYO·Filed 2007·Granted Jan 19, 2010·37 cites·10 claims
- 1093US6525328B1Electron beam lithography system and pattern writing methodTOSHIBA KK·Filed 2000·Granted Feb 25, 2003·50 cites·22 claims
- 1193US5359197AApparatus and method of aligning electron beam of scanning electron microscopeTOSHIBA KK·Filed 1993·Granted Oct 25, 1994·79 cites·32 claims
- 1291US5371371AMagnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lensTOSHIBA KK·Filed 1993·Granted Dec 6, 1994·67 cites·14 claims
- 1391US4807159AApparatus and method for controlling irradiation of an electron beam at a fixed position in an electron beam tester systemTOSHIBA KK·Filed 1986·Granted Feb 21, 1989·72 cites·9 claims
- 1488US6515296B1Pattern dimension measuring system and pattern dimension measuring methodTOSHIBA KK·Filed 2000·Granted Feb 4, 2003·34 cites·14 claims
- 1588US5639699AFocused ion beam deposition using TMCTSTOSHIBA KK·Filed 1995·Granted Jun 17, 1997·62 cites·11 claims
- 1688US5399860AElectron optic column and scanning electron microscopeTOSHIBA KK·Filed 1993·Granted Mar 21, 1995·52 cites·10 claims
- 1788US4902131ASurface inspection method and apparatus thereforTOSHIBA KK·Filed 1986·Granted Feb 20, 1990·64 cites·17 claims
- 1886US6991878B2Photomask repair method and apparatusTOSHIBA KK·Filed 2002·Granted Jan 31, 2006·23 cites·18 claims
- 1986US6414323B1Charged particle beam apparatus and method of controlling charged particle beamTOSHIBA KK·Filed 2000·Granted Jul 2, 2002·30 cites·20 claims
- 2086US5030908AMethod of testing semiconductor elements and apparatus for testing the sameTOSHIBA KK·Filed 1990·Granted Jul 9, 1991·51 cites·4 claims
- 2181US7462829B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2007·Granted Dec 9, 2008·4 cites·10 claims
- 2280US5548183AMagnetic field immersion type electron gunTOSHIBA KK·Filed 1994·Granted Aug 20, 1996·35 cites·8 claims
- 2380US5444256AElectrostatic lens and method for producing the sameTOSHIBA KK·Filed 1993·Granted Aug 22, 1995·29 cites·10 claims
- 2477US6495841B1Charged beam drawing apparatusTOSHIBA KK·Filed 1999·Granted Dec 17, 2002·30 cites·8 claims
- 2577US5491339ACharged particle detection device and charged particle radiation apparatusTOSHIBA KK·Filed 1994·Granted Feb 13, 1996·29 cites·22 claims
- 2676US5569392AMethod and apparatus for repairing defect on plane surface of phase shift maskTOSHIBA KK·Filed 1994·Granted Oct 29, 1996·29 cites·8 claims
- 2774US5498874ADefect detecting apparatus and methodTOSHIBA KK·Filed 1994·Granted Mar 12, 1996·25 cites·4 claims
- 2874US5138169AMethod and apparatus for irradiating low-energy electronsTOSHIBA KK·Filed 1991·Granted Aug 11, 1992·25 cites·14 claims
- 2972US5362968AOptic column having particular major/minor axis magnification ratioTOSHIBA KK·Filed 1993·Granted Nov 8, 1994·33 cites·5 claims
- 3072US5029250APattern configuration measuring apparatusTOSHIBA KK·Filed 1989·Granted Jul 2, 1991·27 cites·6 claims
- 3170US7211796B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 1, 2007·6 cites·15 claims
- 3267US6815698B2Charged particle beam exposure systemTOKYO SHIBAURA ELECTRIC CO·Filed 2001·Granted Nov 9, 2004·11 cites·25 claims
- 3365US5315119AElectron beam irradiating apparatus and electric signal detecting apparatusTOSHIBA KK·Filed 1992·Granted May 24, 1994·14 cites·6 claims
- 3463US7847250B2Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2008·Granted Dec 7, 2010·0 cites·2 claims
- 3562US7193221B2Electronic optical lens barrel and production method thereforTOUDAI TLO LTD·Filed 2003·Granted Mar 20, 2007·4 cites·25 claims
- 3660US5293045AElectrostatic lensTOSHIBA KK·Filed 1992·Granted Mar 8, 1994·13 cites·9 claims
- 3759US5021702AElectron beam apparatus including a plurality of ion pump blocksTOSHIBA KK·Filed 1989·Granted Jun 4, 1991·8 cites·2 claims
- 3857US5413663APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1993·Granted May 9, 1995·28 cites·20 claims
- 3956US6768112B2Substrate inspection system and method for controlling sameTOSHIBA KK·Filed 2001·Granted Jul 27, 2004·1 cites·20 claims
- 4055US4538065AStroboscopic scanning electron microscopeTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Aug 27, 1985·7 cites·6 claims
- 4153US5535508AMethod for producing an electrostatic lensTOSHIBA KK·Filed 1995·Granted Jul 16, 1996·8 cites·1 claims
- 4251US4800268AMethod and apparatus for scanning a laser beam to examine the surface of semiconductor waferTOSHIBA KK·Filed 1987·Granted Jan 24, 1989·13 cites·5 claims
- 4348US4890029AElectron beam apparatus including plurality of ion pump blocksTOSHIBA KK·Filed 1987·Granted Dec 26, 1989·5 cites·6 claims
- 4446US6410439B1Semiconductor polishing apparatus and method for chemical/mechanical polishing of filmsTOSHIBA KK·Filed 2000·Granted Jun 25, 2002·1 cites·3 claims
- 4543US5639308APlasma apparatusTOSHIBA KK·Filed 1995·Granted Jun 17, 1997·13 cites·5 claims
- 4640US4562455ASemiconductor elementTOKYO SHIBAURA ELECTRIC CO·Filed 1984·Granted Dec 31, 1985·8 cites·3 claims
- 4738US5818217AElectron beam irradiating apparatus and electric signal detecting apparatusTOSHIBA KK·Filed 1994·Granted Oct 6, 1998·3 cites·6 claims
- 4831US6171760B1Lithographic method utilizing charged particle beam exposure and fluorescent filmTOSHIBA KK·Filed 1999·Granted Jan 9, 2001·1 cites·7 claims
Join the waitlist — get patent alerts
Get an alert when Motosuke Miyoshi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →