Inventor · disambiguated record
Masato Muraki
Also filed as: MURAKI MASATO
95 granted patents·7 pending applications·3,761 citations·filing 1988–2025
99Inventor score
Top patents by PatentIndex Score
102 records- 0198US7692166B2Charged particle beam exposure apparatusCANON KK·Filed 2007·Granted Apr 6, 2010·47 cites·8 claims
- 0297US7126141B2Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing methodCANON KK·Filed 2005·Granted Oct 24, 2006·38 cites·4 claims
- 0397US6965153B1Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing methodCANON KK·Filed 2001·Granted Nov 15, 2005·62 cites·13 claims
- 0497US5153773AIllumination device including amplitude-division and beam movementsCANON KK·Filed 1990·Granted Oct 6, 1992·214 cites·23 claims
- 0597US4974919AIlluminating deviceCANON KK·Filed 1989·Granted Dec 4, 1990·191 cites·25 claims
- 0696US6323499B1Electron beam exposure apparatus and method, and device manufacturing methodCANON KK·Filed 2000·Granted Nov 27, 2001·106 cites·23 claims
- 0796US6229647B1Reflection and refraction optical system and projection exposure apparatus using the sameCANON KK·Filed 1997·Granted May 8, 2001·132 cites·59 claims
- 0896US6107636AElectron beam exposure apparatus and its control methodCANON KK·Filed 1998·Granted Aug 22, 2000·92 cites·13 claims
- 0996US5463497AIllumination device including an optical integrator defining a plurality of secondary light sources and related methodCANON KK·Filed 1994·Granted Oct 31, 1995·166 cites·38 claims
- 1096US5345292AIllumination device for projection exposure apparatusCANON KK·Filed 1993·Granted Sep 6, 1994·98 cites·60 claims
- 1195US6835937B1Correcting method for correcting exposure data used for a charged particle beam exposure systemCANON KK·Filed 2000·Granted Dec 28, 2004·67 cites·15 claims
- 1295US5864142AElectron beam exposure apparatus and method of controlling sameCANON KK·Filed 1997·Granted Jan 26, 1999·108 cites·36 claims
- 1395US5189494APosition detecting method and apparatusMURAKI MASATO·Filed 1992·Granted Feb 23, 1993·137 cites·51 claims
- 1495US5182455AMethod of detecting relative positional deviation between two objectsCANON KK·Filed 1992·Granted Jan 26, 1993·116 cites·27 claims
- 1594US7005658B2Charged particle beam exposure apparatus and methodCANON KK·Filed 2002·Granted Feb 28, 2006·47 cites·19 claims
- 1694US6566664B2Charged-particle beam exposure apparatus and device manufacturing methodCANON KK·Filed 2001·Granted May 20, 2003·53 cites·38 claims
- 1794US6137113AElectron beam exposure method and apparatusCANON KK·Filed 1998·Granted Oct 24, 2000·94 cites·25 claims
- 1894US5834783AElectron beam exposure apparatus and method, and device manufacturing methodCANON KK·Filed 1997·Granted Nov 10, 1998·143 cites·63 claims
- 1993US6124599AElectron beam exposure system and method of manufacturing devices using the sameCANON KK·Filed 1997·Granted Sep 26, 2000·71 cites·24 claims
- 2093US5981954AElectron beam exposure apparatusCANON KK·Filed 1998·Granted Nov 9, 1999·83 cites·34 claims
- 2192US6903353B2Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatusADVANTEST CORP·Filed 2002·Granted Jun 7, 2005·57 cites·7 claims
- 2292US6818911B2Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing methodCANON KK·Filed 2003·Granted Nov 16, 2004·46 cites·29 claims
- 2391US6953938B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatusHITACHI LTD·Filed 2003·Granted Oct 11, 2005·35 cites·5 claims
- 2491US6919574B2Electron beam exposure apparatus, deflection apparatus, and electron beam exposure methodCANON KK·Filed 2003·Granted Jul 19, 2005·35 cites·10 claims
- 2591US6515409B2Charged-particle beam exposure apparatus, exposure system, control method therefor, and device manufacturing methodCANON KK·Filed 2000·Granted Feb 4, 2003·39 cites·22 claims
- 2691US6483120B1Control system for a charged particle exposure apparatusCANON KK·Filed 2000·Granted Nov 19, 2002·48 cites·27 claims
- 2791US6472672B1Electron beam exposure apparatus and its control methodCANON KK·Filed 2000·Granted Oct 29, 2002·28 cites·16 claims
- 2890US6870171B2Exposure apparatusCANON KK·Filed 2004·Granted Mar 22, 2005·32 cites·8 claims
- 2990US5929454APosition detection apparatus, electron beam exposure apparatus, and methods associated with themCANON KK·Filed 1997·Granted Jul 27, 1999·71 cites·36 claims
- 3089US5973332AElectron beam exposure method, and device manufacturing method using sameCANON KK·Filed 1998·Granted Oct 26, 1999·73 cites·4 claims
- 3189US4947047AExposure system with exposure controlling acoustooptic elementCANON KK·Filed 1988·Granted Aug 7, 1990·53 cites·19 claims
- 3288US7230252B2Aberration adjusting method, device fabrication method, and charged particle beam lithography machineHITACHI HIGH TECH CORP·Filed 2006·Granted Jun 12, 2007·10 cites·8 claims
- 3388US6917045B2Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing methodCANON KK·Filed 2003·Granted Jul 12, 2005·28 cites·12 claims
- 3488US5715084AReflection and refraction optical system and projection exposure apparatus using the sameCANON KK·Filed 1995·Granted Feb 3, 1998·67 cites·13 claims
- 3588US5117254AProjection exposure apparatusCANON KK·Filed 1991·Granted May 26, 1992·61 cites·60 claims
- 3687US7276707B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatusHITACHI LTD·Filed 2005·Granted Oct 2, 2007·9 cites·21 claims
- 3787US6166387AElectron beam exposure apparatus and methodCANON KK·Filed 1999·Granted Dec 26, 2000·65 cites·23 claims
- 3887US5939725AElectron beam exposure apparatusCANON KK·Filed 1998·Granted Aug 17, 1999·52 cites·37 claims
- 3986US6337485B1Electron beam exposure apparatus and its control methodCANON KK·Filed 2000·Granted Jan 8, 2002·19 cites·15 claims
- 4086US5905267AElectron beam exposure apparatus and method of controlling sameCANON KK·Filed 1997·Granted May 18, 1999·113 cites·32 claims
- 4186US5363170AIllumination device and projection exposure apparatus using the sameCANON KK·Filed 1993·Granted Nov 8, 1994·49 cites·57 claims
- 4285US6274877B1Electron beam exposure apparatusCANON KK·Filed 1998·Granted Aug 14, 2001·43 cites·50 claims
- 4385US6104035AElectron-beam exposure apparatus and methodCANON KK·Filed 1998·Granted Aug 15, 2000·45 cites·43 claims
- 4484US7173262B2Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing methodHITACHI HIGH TECH CORP·Filed 2005·Granted Feb 6, 2007·8 cites·17 claims
- 4584US6225637B1Electron beam exposure apparatusCANON KK·Filed 1997·Granted May 1, 2001·43 cites·70 claims
- 4684US5726740AProjection exposure apparatus having illumination device with ring-like or spot-like light sourceCANON KK·Filed 1995·Granted Mar 10, 1998·48 cites·24 claims
- 4783US8610082B2Drawing apparatus and method of manufacturing articleSANO KENTARO·Filed 2012·Granted Dec 17, 2013·5 cites·24 claims
- 4883US6636349B2Reflection and refraction optical system and projection exposure apparatus using the sameCANON KK·Filed 2001·Granted Oct 21, 2003·17 cites·10 claims
- 4983US6552353B1Multi-electron beam exposure method and apparatus and device manufacturing methodCANON KK·Filed 1998·Granted Apr 22, 2003·37 cites·10 claims
- 5083US6054713AElectron beam exposure apparatusCANON KK·Filed 1998·Granted Apr 25, 2000·41 cites·10 claims
Showing the top 50 of 102 patent records by PatentIndex Score.
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