Inventor · disambiguated record
Yasunori Hatamura
Also filed as: HATAMURA YASUNORI
5 granted patents·56 citations·filing 2002–2022
76Inventor score
Technology areasH10P
Top patents by PatentIndex Score
5 records- 0193US7344993B2Low-pressure removal of photoresist and etch residueTOKYO ELECTRON LTD INC·Filed 2005·Granted Mar 18, 2008·39 cites·43 claims
- 0265US6849559B2Method for removing photoresist and etch residuesTOKYO ELECTRON LTD·Filed 2002·Granted Feb 1, 2005·10 cites·38 claims
- 0353US12341001B2Cleaning method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jun 24, 2025·0 cites·12 claims
- 0451US8382942B2Method and apparatus for reducing substrate backside deposition during processingTOKYO ELECTRON LTD·Filed 2004·Granted Feb 26, 2013·7 cites·22 claims
- 0541US11430664B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Aug 30, 2022·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →