Inventor · disambiguated record
Moshe Finarov
Also filed as: FINAROV MOSHE
87 granted patents·18 pending applications·2,338 citations·filing 1991–2025
99Inventor score
Files withNOVA MEASURING INSTR LTD79FINAROV MOSHE10WUHAN DR LASER TECH CORP LTD7ORBOTECH LTD2SUN TERRA LTD2
Top patents by PatentIndex Score
105 records- 0199US6657736B1Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2000·Granted Dec 2, 2003·178 cites·54 claims
- 0298US6974962B2Lateral shift measurement using an optical techniqueNOVA MEASURING INSTR LTD·Filed 2001·Granted Dec 13, 2005·120 cites·17 claims
- 0398US5604344AAutofocussing microscope having a pattern imaging systemNOVA MEASURING INSTR LTD·Filed 1995·Granted Feb 18, 1997·269 cites·18 claims
- 0498US5517312ADevice for measuring the thickness of thin filmsNOVA MEASURING INSTR LTD·Filed 1994·Granted May 14, 1996·162 cites·7 claims
- 0596US5333052AMethod and apparatus for automatic optical inspectionORBOTECH LTD·Filed 1991·Granted Jul 26, 1994·173 cites·36 claims
- 0694US7495782B2Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2007·Granted Feb 24, 2009·12 cites·21 claims
- 0794US6603529B1Monitoring apparatus and method particularly useful in photolithographically processing substratesNOVA MEASURING INSTR LTD·Filed 2000·Granted Aug 5, 2003·48 cites·37 claims
- 0894US5764365ATwo-dimensional beam deflectorNOVA MEASURING INSTR LTD·Filed 1996·Granted Jun 9, 1998·106 cites·11 claims
- 0992US8023122B2Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2010·Granted Sep 20, 2011·6 cites·19 claims
- 1092US7760368B2Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2007·Granted Jul 20, 2010·10 cites·26 claims
- 1192US7477405B2Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2003·Granted Jan 13, 2009·25 cites·96 claims
- 1292US6281974B1Method and apparatus for measurements of patterned structuresNOVA MEASURING INSTR LTD·Filed 2000·Granted Aug 28, 2001·55 cites·40 claims
- 1392US6166801AMonitoring apparatus and method particularly useful in photolithographically processing substratesNOVA MEASURING INSTR LTD·Filed 1998·Granted Dec 26, 2000·154 cites·20 claims
- 1492US6038029AMethod and apparatus for alignment of a waferNOVA MEASURING INSTR LTD·Filed 1998·Granted Mar 14, 2000·95 cites·15 claims
- 1591US8531678B2Method and system for measuring patterned structuresFINAROV MOSHE·Filed 2011·Granted Sep 10, 2013·9 cites·21 claims
- 1691US7715007B2Lateral shift measurement using an optical techniqueNOVA MEASURING INSTR LTD·Filed 2007·Granted May 11, 2010·11 cites·16 claims
- 1791US6764379B2Method and system for endpoint detectionNOVA MEASURING INSTR LTD·Filed 2000·Granted Jul 20, 2004·27 cites·14 claims
- 1891US6650424B2Method and system for measuring in patterned structuresNOVA MEASURING INSTR LTD·Filed 2001·Granted Nov 18, 2003·43 cites·24 claims
- 1991US6100985AMethod and apparatus for measurements of patterned structuresNOVA MEASURING INSTR LTD·Filed 1999·Granted Aug 8, 2000·107 cites·35 claims
- 2090US7289190B2Monitoring apparatus and method particularly useful in photolithographicallyNOVA MEASURING INSTR LTD·Filed 2006·Granted Oct 30, 2007·9 cites·26 claims
- 2189US7791740B2Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2009·Granted Sep 7, 2010·5 cites·10 claims
- 2289US7301163B2Lateral shift measurement using an optical techniqueNOVA MEASURING INSTR LTD·Filed 2006·Granted Nov 27, 2007·9 cites·48 claims
- 2388US11910537B2Pattern transfer printing systems and methodsWUHAN DR LASER TECH CORP LTD·Filed 2022·Granted Feb 20, 2024·2 cites·21 claims
- 2488US7292341B2Optical system operating with variable angle of incidenceNOVA MEASURING INSTR LTD·Filed 2003·Granted Nov 6, 2007·33 cites·3 claims
- 2588US7019850B2Method and system for thin film characterizationNOVA MEASURING INSTR LTD·Filed 2002·Granted Mar 28, 2006·27 cites·35 claims
- 2688US6424417B1Method and system for controlling the photolithography processNOVA MEASURING INSTR LTD·Filed 1998·Granted Jul 23, 2002·68 cites·20 claims
- 2787US7864344B1Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2010·Granted Jan 4, 2011·3 cites·10 claims
- 2887US6842220B1Monitoring apparatus and method particularly useful in photolithographically processing substratesNOVA MEASURING INSTR LTD·Filed 2000·Granted Jan 11, 2005·24 cites·21 claims
- 2987US6407809B1Optical inspection system and methodNOVA MEASURING INSTR LTD·Filed 2000·Granted Jun 18, 2002·37 cites·28 claims
- 3086US9616524B2Light induced patterningMATUSOVSKY MIKHAEL·Filed 2009·Granted Apr 11, 2017·15 cites·64 claims
- 3186US7927184B2Method and system for endpoint detectionNOVA MEASURING INSTR LTD·Filed 2009·Granted Apr 19, 2011·6 cites·6 claims
- 3286US7626710B2Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2007·Granted Dec 1, 2009·8 cites·24 claims
- 3386US7614932B2Method and system for endpoint detectionNOVA MEASURING INSTR LTD·Filed 2007·Granted Nov 10, 2009·7 cites·10 claims
- 3486US6426502B1Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereofNOVA MEASURING INSTR LTD·Filed 1999·Granted Jul 30, 2002·63 cites·21 claims
- 3584US9291911B2Monitoring apparatus and method particularly useful in photolithographically processing substratesNOVA MEASURING INSTR LTD·Filed 2014·Granted Mar 22, 2016·3 cites·23 claims
- 3684US8941832B2Lateral shift measurement using an optical techniqueNOVA MEASURING INSTR LTD·Filed 2013·Granted Jan 27, 2015·3 cites·10 claims
- 3784US5450201AApparatus and method for optical inspection of articlesORBOTECH LTD·Filed 1994·Granted Sep 12, 1995·63 cites·20 claims
- 3883US7864343B2Method and system for measuring patterned structuresNOVA MEASURING INSTR LTD·Filed 2009·Granted Jan 4, 2011·3 cites·19 claims
- 3983US7626711B2Method and system for measuring patterned structuresNOVA MEASURING INSTR·Filed 2007·Granted Dec 1, 2009·4 cites·24 claims
- 4083US6643017B2Method and system for controlling the photolithography processNOVA MEASURING INSTR LTD·Filed 2002·Granted Nov 4, 2003·22 cites·33 claims
- 4183USRE38153ETwo-dimensional beam deflectorNOVA MEASURING INSTR LTD·Filed 2000·Granted Jun 24, 2003·23 cites·22 claims
- 4282US8363219B2Lateral shift measurement using an optical techniqueNOVA MEASURING INSTR LTD·Filed 2010·Granted Jan 29, 2013·3 cites·12 claims
- 4382US7525634B2Monitoring apparatus and method particularly useful in photolithographicallyNOVA MEASURING INSTR LTD·Filed 2007·Granted Apr 28, 2009·4 cites·26 claims
- 4482US7195540B2Method and system for endpoint detectionNOVA MEASURING INSTR LTD·Filed 2004·Granted Mar 27, 2007·14 cites·16 claims
- 4581US7122817B2Lateral shift measurement using an optical techniqueNOVA MEASURING INSTR LTD·Filed 2005·Granted Oct 17, 2006·4 cites·21 claims
- 4680US7595896B2Thin films measurement method and systemNOVA MEASURING INSTR LTD·Filed 2008·Granted Sep 29, 2009·5 cites·13 claims
- 4780US6368181B1Apparatus for optical inspection of wafers during polishingNOVA MEASURING INSTR LTD·Filed 2000·Granted Apr 9, 2002·19 cites·15 claims
- 4879US7030957B2Monitoring apparatus and method particularly useful in photolithographically processing substratesNOVA MEASURING INSTR LTD·Filed 2004·Granted Apr 18, 2006·13 cites·44 claims
- 4978US8277281B2Method and system for endpoint detectionFINAROV MOSHE·Filed 2011·Granted Oct 2, 2012·2 cites·20 claims
- 5078US6791686B1Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereofNOVA MEASURING INSTR LTD·Filed 2000·Granted Sep 14, 2004·22 cites·22 claims
Showing the top 50 of 105 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →