Inventor · disambiguated record
David Dekraker
Also filed as: DEKRAKER DAVID · DEKRAKER DAVID P
14 granted patents·5 pending applications·61 citations·filing 2007–2023
90Inventor score
Technology areasH10P
Top patents by PatentIndex Score
19 records- 0192US8387635B2Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluidsCOLLINS JIMMY D·Filed 2007·Granted Mar 5, 2013·18 cites·18 claims
- 0291US7819984B2Process for treatment of substrates with water vapor or steamFSI INT INC·Filed 2008·Granted Oct 26, 2010·17 cites·6 claims
- 0387US7913706B2Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatusesFSI INT INC·Filed 2008·Granted Mar 29, 2011·14 cites·10 claims
- 0480US9831107B2Processing system and method for providing a heated etching solutionTEL FSI INC·Filed 2014·Granted Nov 28, 2017·4 cites·13 claims
- 0580US9666456B2Method and apparatus for treating a workpiece with arrays of nozzlesTEL FSI INC·Filed 2015·Granted May 30, 2017·2 cites·11 claims
- 0671US9412639B2Method of using separate wafer contacts during wafer processingTEL FSI INC·Filed 2014·Granted Aug 9, 2016·2 cites·7 claims
- 0770US2023352321A1Wet processing of microelectronic substrates with controlled mixing of fluids proximal to substrate surfacesTEL MFG AND ENGINEERING OF AMERICA INC·Filed 2023·Application pending·0 cites
- 0861US9887107B2Methodologies for rinsing tool surfaces in tools used to process microelectronic workpiecesTEL FSI INC·Filed 2016·Granted Feb 6, 2018·1 cites·8 claims
- 0961US9412628B2Acid treatment strategies useful to fabricate microelectronic devices and precursors thereofDEKRAKER DAVID P·Filed 2012·Granted Aug 9, 2016·2 cites·15 claims
- 1058US8142571B2Process for treatment of semiconductor wafer using water vapor containing environmentCHRISTENSON KURT K·Filed 2009·Granted Mar 27, 2012·1 cites·14 claims
- 1156US8967167B2Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluidsFSI INT INC·Filed 2012·Granted Mar 3, 2015·0 cites·10 claims
- 1256US8668778B2Method of removing liquid from a barrier structureFSI INT INC·Filed 2012·Granted Mar 11, 2014·0 cites·13 claims
- 1355US8978675B2Method and apparatus for treating a workpiece with arrays of nozzlesFSI INT INC·Filed 2012·Granted Mar 17, 2015·0 cites·9 claims
- 1447US2011259376A1Wet processing of microelectronic substrates with controlled mixing of fluids proximal to substrate surfacesWAGENER THOMAS J·Filed 2011·Application pending·0 cites
- 1541US8920577B2Process for treatment of substrates with water vapor or steamDEKRAKER DAVID·Filed 2010·Granted Dec 30, 2014·0 cites·19 claims
- 1639US2018190517A1Recipe selectable dispense system and method of operatingTEL FSI INC·Filed 2017·Application pending·0 cites
- 1738US2018025904A1Systems and Methods for Treating Substrates with Cryogenic Fluid MixturesTEL FSI INC·Filed 2017·Application pending·0 cites
- 1834US9263303B2Methodologies for rinsing tool surfaces in tools used to process microelectronic workpiecesSTIYER MARK A·Filed 2011·Granted Feb 16, 2016·0 cites·9 claims
- 1930US2016284535A1Method for wet stripping silicon-containing organic layersTEL FSI INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →