Inventor · disambiguated record
Shoji Mimotogi
Also filed as: MIMOTOGI SHOJI
40 granted patents·15 pending applications·336 citations·filing 1995–2024
98Inventor score
Top patents by PatentIndex Score
55 records- 0190US8381138B2Simulation model creating method, computer program product, and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2012·Granted Feb 19, 2013·8 cites·20 claims
- 0288US7685556B2Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Mar 23, 2010·10 cites·17 claims
- 0386US7248349B2Exposure method for correcting a focal point, and a method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2005·Granted Jul 24, 2007·10 cites·15 claims
- 0486US6649310B2Method of manufacturing photomaskTOSHIBA KK·Filed 2001·Granted Nov 18, 2003·26 cites·60 claims
- 0584US7840390B2Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording mediumTOSHIBA KK·Filed 2007·Granted Nov 23, 2010·7 cites·13 claims
- 0678US7636910B2Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor deviceTOSHIBA KK·Filed 2006·Granted Dec 22, 2009·4 cites·13 claims
- 0777US7336341B2Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulatorTOSHIBA KK·Filed 2005·Granted Feb 26, 2008·8 cites·20 claims
- 0876US7596776B2Light intensity distribution simulation method and computer program productTOSHIBA KK·Filed 2007·Granted Sep 29, 2009·7 cites·18 claims
- 0975US7793252B2Mask pattern preparation method, semiconductor device manufacturing method and recording mediumTOSHIBA KK·Filed 2008·Granted Sep 7, 2010·3 cites·12 claims
- 1075US6294297B1Computer program product for calculating a process tolerance relating exposure amount and focal point positionTOSHIBA KK·Filed 1999·Granted Sep 25, 2001·31 cites·7 claims
- 1174US6418553B1Circuit designing method for semiconductor device and computer-readable mediumTOSHIBA KK·Filed 2000·Granted Jul 9, 2002·13 cites·16 claims
- 1273US7560197B2Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing methodTOSHIBA KK·Filed 2005·Granted Jul 14, 2009·3 cites·8 claims
- 1372US7319944B2Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resistTOSHIBA KK·Filed 2004·Granted Jan 15, 2008·11 cites·31 claims
- 1471US7090949B2Method of manufacturing a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Aug 15, 2006·14 cites·16 claims
- 1570US2025200241A1Lithography simulation method and optical proximity effect correction methodKIOXIA CORP·Filed 2024·Application pending·0 cites
- 1665US7426712B2Lithography simulation method and recording mediumTOSHIBA KK·Filed 2006·Granted Sep 16, 2008·1 cites·8 claims
- 1765US2025291243A1Inspection device, inspection method, and mediumKIOXIA CORP·Filed 2024·Application pending·0 cites
- 1864US8809072B2Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor deviceKODAMA CHIKAAKI·Filed 2011·Granted Aug 19, 2014·1 cites·18 claims
- 1963US8055366B2Simulation model creating method, mask data creating method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2009·Granted Nov 8, 2011·1 cites·20 claims
- 2063US6632592B1Resist pattern forming methodTOSHIBA KK·Filed 2000·Granted Oct 14, 2003·7 cites·14 claims
- 2161US7229721B2Method for evaluating photo mask and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2003·Granted Jun 12, 2007·6 cites·20 claims
- 2261US7148138B2Method of forming contact hole and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted Dec 12, 2006·9 cites·20 claims
- 2361US6967719B2Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted Nov 22, 2005·6 cites·14 claims
- 2460US7446852B2Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program projectTOSHIBA KK·Filed 2007·Granted Nov 4, 2008·1 cites·10 claims
- 2559US8154710B2Lithography process window analyzing method and analyzing programMIMOTOGI SHOJI·Filed 2009·Granted Apr 10, 2012·2 cites·12 claims
- 2659US2024427229A1Manufacturing method for photomask, and photomaskKIOXIA CORP·Filed 2024·Application pending·0 cites
- 2757US5889678ATopography simulation methodTOSHIBA KK·Filed 1997·Granted Mar 30, 1999·32 cites·10 claims
- 2857US2024105420A1Data generation apparatus, data generation method, and computer-readable storage mediumKIOXIA CORP·Filed 2023·Application pending·0 cites
- 2956US2010112812A1Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor deviceTOSHIBA KK·Filed 2009·Application pending·0 cites
- 3053US5889686AProfile simulation methodTOSHIBA KK·Filed 1997·Granted Mar 30, 1999·28 cites·8 claims
- 3151US7912275B2Method of evaluating a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2009·Granted Mar 22, 2011·0 cites·13 claims
- 3251US7575835B2Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure methodTOSHIBA KK·Filed 2006·Granted Aug 18, 2009·0 cites·7 claims
- 3351US5733687APhotomask, exposing method using photomask, and manufacturing method of photomaskTOSHIBA KK·Filed 1995·Granted Mar 31, 1998·12 cites·14 claims
- 3450US6252651B1Exposure method and exposure apparatus using itTOSHIBA KK·Filed 1999·Granted Jun 26, 2001·10 cites·9 claims
- 3549US6249900B1Method of designing an LSI pattern to be formed on a specimen with a bent portionTOSHIBA KK·Filed 1998·Granted Jun 19, 2001·11 cites·20 claims
- 3649US2010167190A1Pattern-correction supporting method, method of manufacturing semiconductor device and pattern-correction supporting programTAKAHATA KAZUHIRO·Filed 2009·Application pending·0 cites
- 3748US8230369B2Simulation method and simulation programMIMOTOGI AKIKO·Filed 2009·Granted Jul 24, 2012·0 cites·9 claims
- 3848US5906903AProcess tolerance calculating method relating exposure amount and focal point position to allowable dimension valueTOSHIBA KK·Filed 1998·Granted May 25, 1999·9 cites·7 claims
- 3948US2022082933A1Original plate and method of manufacturing the sameKIOXIA CORP·Filed 2021·Application pending·0 cites
- 4047US6225033B1Method of forming a resist patternTOSHIBA KK·Filed 1999·Granted May 1, 2001·9 cites·14 claims
- 4146US6107013AExposure method and exposure apparatus using itTOSHIBA KK·Filed 1997·Granted Aug 22, 2000·8 cites·12 claims
- 4245US6045981AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1998·Granted Apr 4, 2000·9 cites·16 claims
- 4345US2021341830A1Pattern forming method, photomask substrate creation method, photomask creation method, and photomaskKIOXIA CORP·Filed 2021·Application pending·0 cites
- 4444US8077292B2Projection exposure methodKITAMURA YOSUKE·Filed 2009·Granted Dec 13, 2011·0 cites·12 claims
- 4543US7118834B2Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure methodTOSHIBA KK·Filed 2004·Granted Oct 10, 2006·0 cites·13 claims
- 4642US5876885AProfile simulation method, dependent on curvature of processed surface, and mask design method utilizing simulationTOSHIBA KK·Filed 1996·Granted Mar 2, 1999·7 cites·12 claims
- 4742US5745388AProfile simulation method and pattern design methodTOSHIBA KK·Filed 1995·Granted Apr 28, 1998·12 cites·12 claims
- 4841US2006001846A1Exposure system and method for manufacturing semiconductor deviceKONO TAKUYA·Filed 2005·Application pending·0 cites
- 4940US2006073425A1Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Application pending·0 cites
- 5040US2005166172A1Critical pattern extracting method, critical pattern extracting program, and method of manufacturing semiconductor deviceFiled 2004·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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