Inventor · disambiguated record
Masayuki Sawataishi
Also filed as: SAWATAISHI MASAYUKI
8 granted patents·3 pending applications·4 citations·filing 2004–2022
74Inventor score
Top patents by PatentIndex Score
11 records- 0186US12154790B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Nov 26, 2024·1 cites·19 claims
- 0271US9735021B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted Aug 15, 2017·2 cites·6 claims
- 0345US7256135B2Etching method and computer storage medium storing program for controlling sameTOKYO ELECTRON LTD·Filed 2004·Granted Aug 14, 2007·1 cites·15 claims
- 0443US11062881B2Plasma etching method and plasma processing deviceTOKYO ELECTRON LTD·Filed 2019·Granted Jul 13, 2021·0 cites·19 claims
- 0543US8282844B2Method for etching metal nitride with high selectivity to other materialsKO AKITERU·Filed 2007·Granted Oct 9, 2012·0 cites·14 claims
- 0643US2007211402A1Substrate processing apparatus, substrate attracting method, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0742US9428838B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Aug 30, 2016·0 cites·8 claims
- 0840US11688650B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 27, 2023·0 cites·12 claims
- 0936US9735025B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted Aug 15, 2017·0 cites·5 claims
- 1032US2019051500A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1123US2017186591A1Cleaning method of plasma processing apparatus and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →