Inventor · disambiguated record
Ryan Pearman
Also filed as: PEARMAN RYAN
12 granted patents·1 pending application·30 citations·filing 2013–2023
86Inventor score
Top patents by PatentIndex Score
13 records- 0196US11062878B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2020·Granted Jul 13, 2021·5 cites·15 claims
- 0294US9038003B2Method and system for critical dimension uniformity using charged particle beam lithographyD2S INC·Filed 2013·Granted May 19, 2015·12 cites·29 claims
- 0391US11756765B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2021·Granted Sep 12, 2023·2 cites·16 claims
- 0490US10748744B1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2019·Granted Aug 18, 2020·5 cites·14 claims
- 0584US10460071B2Shaped beam lithography including temperature effectsD2S INC·Filed 2016·Granted Oct 29, 2019·4 cites·17 claims
- 0680US12243712B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2023·Granted Mar 4, 2025·0 cites·17 claims
- 0779US11886166B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2023·Granted Jan 30, 2024·0 cites·20 claims
- 0872US2023124768A1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2022·Application pending·0 cites
- 0971US11592802B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2020·Granted Feb 28, 2023·0 cites·18 claims
- 1071US9104109B2Method and system for improving critical dimension uniformity using shaped beam lithographyD2S INC·Filed 2013·Granted Aug 11, 2015·2 cites·20 claims
- 1169US11604451B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2021·Granted Mar 14, 2023·0 cites·19 claims
- 1261US10884395B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2018·Granted Jan 5, 2021·0 cites·20 claims
- 1351US9046761B2Lithography mask having sub-resolution phased assist featuresINTEL CORP·Filed 2013·Granted Jun 2, 2015·0 cites·25 claims
Join the waitlist — get patent alerts
Get an alert when Ryan Pearman files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →