Inventor · disambiguated record
Fumiyoshi Urano
Also filed as: URANO FUMIYOSHI
26 granted patents·1,020 citations·filing 1984–2002
97Inventor score
Top patents by PatentIndex Score
26 records- 0197US5350660AChemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphereWAKO PURE CHEM IND LTD·Filed 1991·Granted Sep 27, 1994·210 cites·19 claims
- 0295US6723483B1Sulfonium salt compoundsWAKO PURE CHEM IND LTD·Filed 2000·Granted Apr 20, 2004·65 cites·34 claims
- 0389US7312014B2Resist compositionsWAKO PURE CHEM IND LTD·Filed 2002·Granted Dec 25, 2007·40 cites·24 claims
- 0488US5558976APattern formation methodWAKO PURE CHEM IND LTD·Filed 1995·Granted Sep 24, 1996·67 cites·2 claims
- 0587US5558971AResist materialWAKO PURE CHEM IND LTD·Filed 1995·Granted Sep 24, 1996·79 cites·7 claims
- 0683US6656660B1Resist compositionSUMITOMO CHEMICAL CO·Filed 2000·Granted Dec 2, 2003·56 cites·2 claims
- 0781US5695910AResist composition for deep ultraviolet lightWAKO PURE CHEM IND LTD·Filed 1996·Granted Dec 9, 1997·44 cites·6 claims
- 0881US5468589AResist material and pattern formation processWAKO PURE CHEM IND LTD·Filed 1992·Granted Nov 21, 1995·72 cites·10 claims
- 0981US4574156APolymethoxybenzyl piperazine derivatives effective for improving blood circulation systemWAKO PURE CHEM IND LTD·Filed 1984·Granted Mar 4, 1986·25 cites·6 claims
- 1076US5677112AProcess for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent compositionWAKO PURE CHEM IND LTD·Filed 1996·Granted Oct 14, 1997·44 cites·4 claims
- 1176US5670299APattern formation processWAKO PURE CHEM IND LTD·Filed 1995·Granted Sep 23, 1997·47 cites·18 claims
- 1276US5216135ADiazodisulfonesWAKO PURE CHEM IND LTD·Filed 1992·Granted Jun 1, 1993·25 cites·7 claims
- 1373US6033826APolymer and resist materialWAKO PURE CHEM IND LTD·Filed 1996·Granted Mar 7, 2000·33 cites·11 claims
- 1473US5976759APolymer composition and resist materialWAKO PURE CHEM IND LTD·Filed 1996·Granted Nov 2, 1999·44 cites·31 claims
- 1571US5780206AFine pattern forming process using a resist composition sensitive to deep ultraviolet lightWAKO PURE CHEM IND LTD·Filed 1997·Granted Jul 14, 1998·38 cites·2 claims
- 1671US5389491ANegative working resist compositionMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Feb 14, 1995·24 cites·8 claims
- 1764US5272036APattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1992·Granted Dec 21, 1993·18 cites·20 claims
- 1862US5627006AResist materialWAKO PURE CHEM IND LTD·Filed 1995·Granted May 6, 1997·22 cites·14 claims
- 1958US5576359ADeep ultraviolet absorbent compositionWAKO PURE CHEM IND LTD·Filed 1994·Granted Nov 19, 1996·23 cites·4 claims
- 2054US5498748AAnthracene derivativesWAKO PURE CHEM IND LTD·Filed 1994·Granted Mar 12, 1996·23 cites·5 claims
- 2151US6586152B1Agent for reducing substrate dependenceWAKO PURE CHEM IND LTD·Filed 2000·Granted Jul 1, 2003·14 cites·40 claims
- 2243US7374857B2Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the compositionWAKO PURE CHEM IND LTD·Filed 2002·Granted May 20, 2008·0 cites·13 claims
- 2340USRE40211EDiazodisulfonesWAKO PURE CHEM IND LTD·Filed 2001·Granted Apr 1, 2008·0 cites·7 claims
- 2436US5128062AOptically active compounds and liquid crystal compositions containing such compoundsWAKO PURE CHEM IND LTD·Filed 1990·Granted Jul 7, 1992·4 cites·6 claims
- 2536US5114615ALiquid crystal compounds and intermediates thereofWAKO PURE CHEM IND LTD·Filed 1991·Granted May 19, 1992·1 cites·4 claims
- 2634US5973094AFunctional polymersWAKO PURE CHEM IND LTD·Filed 1997·Granted Oct 26, 1999·2 cites·3 claims
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