Inventor · disambiguated record
Niels Geypen
Also filed as: GEYPEN NIELS
8 granted patents·2 pending applications·17 citations·filing 2014–2022
82Inventor score
Files withASML NETHERLANDS BV10
Top patents by PatentIndex Score
10 records- 0192US9910366B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Mar 6, 2018·9 cites·20 claims
- 0283US10126662B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Nov 13, 2018·2 cites·12 claims
- 0378US10331041B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jun 25, 2019·1 cites·12 claims
- 0478US10234771B2HHG source, inspection apparatus and method for performing a measurementASML NETHERLANDS BV·Filed 2017·Granted Mar 19, 2019·2 cites·19 claims
- 0575US10816906B2HHG source, inspection apparatus and method for performing a measurementASML NETHERLANDS BV·Filed 2019·Granted Oct 27, 2020·1 cites·20 claims
- 0673US10670974B2Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrateASML NETHERLANDS BV·Filed 2018·Granted Jun 2, 2020·1 cites·16 claims
- 0773US10401739B2Method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatusASML NETHERLANDS BV·Filed 2018·Granted Sep 3, 2019·1 cites·20 claims
- 0865US10725386B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Jul 28, 2020·0 cites·20 claims
- 0955US2024369944A1Method for determining a stochastic metric relating to a lithographic processASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1048US2023040124A1Method for correcting measurements in the manufacture of integrated circuits and associated apparatusesASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Niels Geypen files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →