Inventor · disambiguated record
Yosuke Kojima
Also filed as: KOJIMA YOSUKE
13 granted patents·8 pending applications·75 citations·filing 2006–2023
89Inventor score
Files withTOPPAN PHOTOMASK CO LTD6SHINETSU CHEMICAL CO5TOPPAN PRINTING CO LTD5KOJIMA YOSUKE2NEC CORP1
Top patents by PatentIndex Score
21 records- 0196US7767366B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 3, 2010·34 cites·23 claims
- 0295US8012654B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Sep 6, 2011·11 cites·22 claims
- 0394US8003284B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Aug 23, 2011·9 cites·23 claims
- 0490US7989124B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2010·Granted Aug 2, 2011·6 cites·19 claims
- 0589US7767367B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2007·Granted Aug 3, 2010·10 cites·35 claims
- 0672US8475978B2Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material filmYOSHIKAWA HIROKI·Filed 2011·Granted Jul 2, 2013·2 cites·16 claims
- 0764US7754397B2Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor elementTOPPAN PRINTING CO LTD·Filed 2007·Granted Jul 13, 2010·2 cites·8 claims
- 0861US9091931B2Photomask blank and method for manufacturing photomaskKOJIMA YOSUKE·Filed 2012·Granted Jul 28, 2015·1 cites·6 claims
- 0961US2025130488A1Photomask blank, photomask, and method for manufacturing photomaskTOPPAN PHOTOMASK CO LTD·Filed 2023·Application pending·0 cites
- 1057US2021295964A1Information processing system, information processing method, and non-transitory storage mediumNEC CORP·Filed 2021·Application pending·0 cites
- 1154US2024302732A1Phase shift mask blank, phase shift mask, and method for manufacturing phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2022·Application pending·0 cites
- 1254US2024152045A1Phase shift mask blank, phase shift mask, method for manufacturing phase shift mask, and method for modifying phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2022·Application pending·0 cites
- 1353US2023333461A1Phase shift mask blank, phase shift mask, and method for manufacturing phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2021·Application pending·0 cites
- 1453US2024419064A1Phase shift mask and method for manufacturing phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2023·Application pending·0 cites
- 1552US2023070724A1Reflective mask blank, reflective mask, reflective mask manufacturing method, and reflective mask correction methodTOPPAN PHOTOMASK CO LTD·Filed 2020·Application pending·0 cites
- 1648US8753786B2Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blankSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 17, 2014·0 cites·9 claims
- 1747US8913079B2Apparatus, a method and a program thereofKOJIMA YOSUKE·Filed 2011·Granted Dec 16, 2014·0 cites·11 claims
- 1846US2025147408A1Phase shift mask and method for manufacturing phase shift maskTEKSCEND PHOTOMASK CORP·Filed 2023·Application pending·0 cites
- 1945US11187974B2Photomask blank, photomask, and photomask manufacturing methodTOPPAN PRINTING CO LTD·Filed 2019·Granted Nov 30, 2021·0 cites·10 claims
- 2045US8753787B2Light pattern exposure method, photomask, and photomask blankSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 17, 2014·0 cites·9 claims
- 2141US7632613B2Levenson type phase shift mask and manufacturing method thereofTOPPAN PRINTING CO LTD·Filed 2006·Granted Dec 15, 2009·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →