Inventor · disambiguated record
Kwang-Shin Lim
Also filed as: LIM KWANG-SHIN
13 granted patents·8 pending applications·105 citations·filing 1998–2017
90Inventor score
Top patents by PatentIndex Score
21 records- 0191US7951653B1Methods of manufacturing a semiconductor device using compositions for etching copperSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted May 31, 2011·15 cites·13 claims
- 0284US7351667B2Etching solution for silicon oxide method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 1, 2008·10 cites·10 claims
- 0383US10495615B2Evaluation systems of block copolymer patternsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Dec 3, 2019·2 cites·9 claims
- 0469US7311857B2Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Dec 25, 2007·13 cites·3 claims
- 0563US7687448B2Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Mar 30, 2010·0 cites·14 claims
- 0660US5883060ACleaning compositions for wafers used in semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Mar 16, 1999·21 cites·7 claims
- 0756US7608540B2Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 27, 2009·0 cites·18 claims
- 0855US6905570B2Apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 14, 2005·5 cites·19 claims
- 0954US5782984AMethod for cleaning an integrated circuit device using an aqueous cleaning compositionSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Jul 21, 1998·16 cites·9 claims
- 1053US7795198B2Composition for removing a polymeric contaminant and method of removing a polymeric contaminant using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 14, 2010·0 cites·6 claims
- 1146US6071827AMethod for manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Jun 6, 2000·12 cites·14 claims
- 1244US6232239B1Method for cleaning contact holes in a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted May 15, 2001·11 cites·28 claims
- 1343US2004226186A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 1441US2004010932A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 1541US2014197068A1Wafer holding apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 1641US2018045697A1Thermal desorption system and method of analyzing a substrate using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
- 1739US2007144559A1Unit for preventing a substrate from drying, substrate cleaning apparatus having the unit and method of cleaning the substrate using the unitLIM KWANG-SHIN·Filed 2006·Application pending·0 cites
- 1838US2007037400A1Composition and methods removing polysiliconHWANG DONG-WON·Filed 2006·Application pending·0 cites
- 1937US10234435B2Conductivity detector and ion chromatography system including the sameJUNG SUNGHAN·Filed 2016·Granted Mar 19, 2019·0 cites·20 claims
- 2034US2006154484A1Method of removing a low-k layer and method of recycling a wafer using the sameHWANG DONG-WON·Filed 2006·Application pending·0 cites
- 2133US2007000523A1Cleaning composition and related methodsKIM SE-YEON·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →