Inventor · disambiguated record
Keiichi Shimoda
Also filed as: SHIMODA KEIICHI
7 granted patents·54 citations·filing 1993–2019
81Inventor score
Top patents by PatentIndex Score
7 records- 0194US9647206B2Method for etching layer to be etchedTOKYO ELECTRON LTD·Filed 2014·Granted May 9, 2017·14 cites·4 claims
- 0283US10053773B2Method of cleaning plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 21, 2018·3 cites·13 claims
- 0380US5356719AFluorosilicone release agent compositionDOW CORNING TORAY SILICONE·Filed 1993·Granted Oct 18, 1994·34 cites·20 claims
- 0476US10403814B2Method of cleaning and method of plasma processingTOKYO ELECTRON LTD·Filed 2016·Granted Sep 3, 2019·2 cites·8 claims
- 0574US10944051B2Method of cleaning a substrate processing apparatus and the substrate processing apparatus performing the methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 9, 2021·1 cites·16 claims
- 0661US10975468B2Method of cleaning plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 13, 2021·0 cites·6 claims
- 0745US9803286B2Method for etching copper layerTOKYO ELECTRON LTD·Filed 2014·Granted Oct 31, 2017·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →