Inventor · disambiguated record
Song Yun Kang
Also filed as: KANG SONG Y · KANG SONG YUN
12 granted patents·13 pending applications·5 citations·filing 2004–2024
82Inventor score
Top patents by PatentIndex Score
25 records- 0176US10403814B2Method of cleaning and method of plasma processingTOKYO ELECTRON LTD·Filed 2016·Granted Sep 3, 2019·2 cites·8 claims
- 0276US7763551B2RLSA CVD deposition control using halogen gas for hydrogen scavengingTOKYO ELECTRON LTD·Filed 2008·Granted Jul 27, 2010·2 cites·14 claims
- 0374US10944051B2Method of cleaning a substrate processing apparatus and the substrate processing apparatus performing the methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 9, 2021·1 cites·16 claims
- 0467US2024222157A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0559US2025240960A1Semiconductor device, method of fabricating the same, and electronic system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0655US2021305066A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0753US11171286B2Method of processing workpieceTOKYO ELECTRON LTD·Filed 2018·Granted Nov 9, 2021·0 cites·5 claims
- 0853US11152564B2Substrate manufacturing method and processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Oct 19, 2021·0 cites·4 claims
- 0952US11832524B2Method for processing substrate, processing apparatus, and processing systemTOKYO ELECTRON LTD·Filed 2019·Granted Nov 28, 2023·0 cites·10 claims
- 1049US2024203693A1Plasma processing equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1147US2012247390A1Film formation apparatusSAWADA IKUO·Filed 2010·Application pending·0 cites
- 1247US2013240479A1Method for producing filtration filterTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1346US2011017706A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1444US2023371242A1Method for fabricating semiconductor device with oxide semiconductor materialTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1544US2014299272A1Plasma generation device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1643US10181559B2Etching methodTOKYO ELECTRON LTD·Filed 2017·Granted Jan 15, 2019·0 cites·10 claims
- 1742US7348129B2Electron beam processing method and apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Mar 25, 2008·0 cites·10 claims
- 1842US2007243327A1Film forming method and apparatusKANG SONG Y·Filed 2006·Application pending·0 cites
- 1941US9611545B2ZnO film production system and production method using ZnO film production system having heating units and control deviceTOKYO ELECTRON LTD·Filed 2013·Granted Apr 4, 2017·0 cites·5 claims
- 2040US2020243759A1Method of etchingTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2139US9947864B2Method for etching object to be processedTOKYO ELECTRON LTD·Filed 2015·Granted Apr 17, 2018·0 cites·12 claims
- 2237US2017346001A1Method of manufacturing magnetoresistive device and magnetoresistive device manufacturing systemTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 2336US10790152B2Method for etching multilayer filmTOKYO ELECTRON LTD·Filed 2016·Granted Sep 29, 2020·0 cites·7 claims
- 2433US8753988B2Starting material for use in forming silicon oxide film and method for forming silicon oxide film using sameKANG SONG YUN·Filed 2010·Granted Jun 17, 2014·0 cites·7 claims
- 2529US2012052658A1Quantum dot forming method, storage medium storing a program and substrate processing apparatus for execution of the methodKANG SONG YUN·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →