Inventor · disambiguated record
Anseime Chen
Also filed as: CHEN ANSEIME
10 granted patents·3 pending applications·330 citations·filing 1999–2001
91Inventor score
Files withUNITED MICROELECTRONICS CORP10
Top patents by PatentIndex Score
13 records- 0191US6323123B1Low-K dual damascene integration processUNITED MICROELECTRONICS CORP·Filed 2000·Granted Nov 27, 2001·71 cites·19 claims
- 0289US6420791B1Alignment mark designUNITED MICROELECTRONICS CORP·Filed 1999·Granted Jul 16, 2002·111 cites·16 claims
- 0381US6080527AOptical proximity correction of L and T shaped patterns on negative photoresistUNITED MICROELECTRONICS CORP·Filed 1999·Granted Jun 27, 2000·59 cites·3 claims
- 0477US6680252B2Method for planarizing barc layer in dual damascene processUNITED MICROELECTRONICS CORP·Filed 2001·Granted Jan 20, 2004·25 cites·19 claims
- 0577US6492097B1Process for increasing a line width window in a semiconductor processUNITED MICROELECTRONICS CORP·Filed 2000·Granted Dec 10, 2002·19 cites·10 claims
- 0667US6489085B2Thermal reflow photolithographic processUNITED MICROELECTRONICS CORP·Filed 2000·Granted Dec 3, 2002·10 cites·7 claims
- 0767US6444410B1Method of improving photoresist profileUNITED MICROELECTRONICS CORP·Filed 2000·Granted Sep 3, 2002·10 cites·13 claims
- 0867US6417096B1Method for avoiding photo residue in dual damascene with acid treatmentUNITED MICROELECTRONICS CORP·Filed 2000·Granted Jul 9, 2002·12 cites·20 claims
- 0958US6350681B1Method of forming dual damascene structureUNITED MICROELECTRONICS CORP·Filed 2001·Granted Feb 26, 2002·9 cites·18 claims
- 1045US2002034647A1Methof for forming dielectric of low dielectric constant on hydrophilic dielectric and the structureFiled 2001·Application pending·0 cites
- 1137US6312855B1Three-phase phase shift maskUNITED MICROELECTRONICS CORP·Filed 1999·Granted Nov 6, 2001·4 cites·11 claims
- 1235US2002164889A1Method for improving adhesion of low k materials with adjacent layerFiled 2001·Application pending·0 cites
- 1335US2002168590A1Method of forming storage nodes in a DRAMFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →