Inventor · disambiguated record
Masato Kaneda
Also filed as: KANEDA MASATO
7 granted patents·4 pending applications·55 citations·filing 1991–2022
81Inventor score
Top patents by PatentIndex Score
11 records- 0176US7230145B2Catalyst for producing both end-hydroxyl group-terminated diols, process for producing the catalyst, process for producing the diols by using the catalyst, and both end-hydroxyl group-terminated diols obtained by the processSHOWA DENKO KK·Filed 2004·Granted Jun 12, 2007·15 cites·10 claims
- 0265US6069222APolyester and polyurethane derived from specific alicyclic diolsSHOWA DENKO KK·Filed 1998·Granted May 30, 2000·19 cites·16 claims
- 0363US5164425AArtificial marble compositionSHOWA DENKO KK·Filed 1991·Granted Nov 17, 1992·19 cites·24 claims
- 0460US7510815B2Removing solution for photosensitive compositionSHOWA DENKO KK·Filed 2006·Granted Mar 31, 2009·1 cites·17 claims
- 0557US2025170155A1Nucleoside derivatives and prodrugs thereof having viral growth inhibitory actionSHIONOGI & CO·Filed 2022·Application pending·0 cites
- 0651US6410809B1Cyclohexanedimethanol compound and process of producing productive intermediates thereforSHOWA DENKO KK·Filed 2000·Granted Jun 25, 2002·1 cites·14 claims
- 0740US8431333B2Method for removing an uncured photosensitive compositionKANEDA MASATO·Filed 2011·Granted Apr 30, 2013·0 cites·3 claims
- 0840US2003119666A1Catalyst for producing both end-hydroxyl group-terminated diols, process for producing the catalyst, process for producing the diols by using the catalyst, and both end-hydroxyl group-terminated diols obtained by the processFiled 2002·Application pending·0 cites
- 0934US2009208887A1Removing solution for photosensitive compositionSHOWA DENKO KK·Filed 2006·Application pending·0 cites
- 1033US8153357B2Photosensitive composition removerKANEDA MASATO·Filed 2004·Granted Apr 10, 2012·0 cites·6 claims
- 1133US2008167210A1Removing Solution for Photosensitive CompositionSHOWA DENKO KK·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →