Inventor · disambiguated record
Aurélie Kuroda
Also filed as: KURODA AURELIE · KURODA AURÉLIE
5 granted patents·3 pending applications·7 citations·filing 2017–2023
68Inventor score
Files withASM IP HOLDING BV8
Top patents by PatentIndex Score
8 records- 0187US9947582B1Processes for preventing oxidation of metal thin filmsASM IP HOLDING BV·Filed 2017·Granted Apr 17, 2018·5 cites·21 claims
- 0282US11610774B2Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition processASM IP HOLDING BV·Filed 2020·Granted Mar 21, 2023·1 cites·19 claims
- 0372US12230497B2Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition processASM IP HOLDING BV·Filed 2022·Granted Feb 18, 2025·0 cites·23 claims
- 0465US10910262B2Method of selectively depositing a capping layer structure on a semiconductor device structureASM IP HOLDING BV·Filed 2017·Granted Feb 2, 2021·1 cites·22 claims
- 0555US2023335392A1Deposition of flowable sicn films by plasma enhanced atomic layer depositionASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 0652US2019249303A1Chemical precursors and methods for depositing a silicon oxide film on a substrate utilizing chemical precursorsASM IP HOLDING BV·Filed 2019·Application pending·0 cites
- 0747US12031205B2Method and system for forming a conformal silicon carbon nitride layer and structure formed using sameASM IP HOLDING BV·Filed 2022·Granted Jul 9, 2024·0 cites·16 claims
- 0840US2021225643A1Method for deposition of silicon nitride layer using pretreatment, structure formed using the method, and system for performing the methodASM IP HOLDING BV·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →