Inventor · disambiguated record
Georg Roters
Also filed as: ROTERS GEORG
7 granted patents·1 pending application·68 citations·filing 1997–2012
84Inventor score
Files withMATTSON THERMAL PRODUCTS GMBH2PEUSE BRUCE W2INFINEON TECHNOLOGIES AG1MATTSON TECH INC1MATTSON THERMAL PRODUCTS1
Top patents by PatentIndex Score
8 records- 0186US8236706B2Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structuresPEUSE BRUCE W·Filed 2008·Granted Aug 7, 2012·14 cites·11 claims
- 0264US7144826B2Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environmentMATTSON THERMAL PRODUCTS·Filed 2002·Granted Dec 5, 2006·15 cites·28 claims
- 0360US7101812B2Method of forming and/or modifying a dielectric film on a semiconductor surfaceMATTSON TECH INC·Filed 2003·Granted Sep 5, 2006·10 cites·33 claims
- 0450US5935650AMethod of oxidation of semiconductor wafers in a rapid thermal processing (RTP) systemFiled 1997·Granted Aug 10, 1999·22 cites·13 claims
- 0549US7151060B2Device and method for thermally treating semiconductor wafersMATTSON THERMAL PRODUCTS GMBH·Filed 2003·Granted Dec 19, 2006·4 cites·34 claims
- 0645US2012298039A1Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structuresPEUSE BRUCE W·Filed 2012·Application pending·0 cites
- 0744US7144747B2Method for thermally treating a substrate that comprises several layersMATTSON THERMAL PRODUCTS GMBH·Filed 2002·Granted Dec 5, 2006·1 cites·16 claims
- 0840US7094637B2Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gatesINFINEON TECHNOLOGIES AG·Filed 2003·Granted Aug 22, 2006·2 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →