Inventor · disambiguated record
Nobuo Tokutake
Also filed as: TOKUTAKE NOBUO
15 granted patents·182 citations·filing 1987–2007
93Inventor score
Top patents by PatentIndex Score
15 records- 0186US7935397B2Ink jet recording medium and ink jet recording methodCANON KK·Filed 2007·Granted May 3, 2011·7 cites·5 claims
- 0286US5434031APositive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additiveTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 18, 1995·16 cites·9 claims
- 0368US4882260APositive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dyeTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Nov 21, 1989·19 cites·5 claims
- 0464US5601961AHigh-sensitivity positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 11, 1997·24 cites·44 claims
- 0561US5498514ALithographic double-coated patterning plate with undercoat levelling layerTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 12, 1996·13 cites·3 claims
- 0658US5501936APositive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compoundTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 26, 1996·15 cites·11 claims
- 0757US6132817AMethod of manufacturing photoelectric transducer with improved ultrasonic and purification stepsCANON KK·Filed 1997·Granted Oct 17, 2000·22 cites·29 claims
- 0856US5478692APositive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenoneTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Dec 26, 1995·13 cites·10 claims
- 0955US7425457B2Method and apparatus for irradiating simulated solar radiationCANON KK·Filed 2004·Granted Sep 16, 2008·5 cites·38 claims
- 1050US5576138APositive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additivesTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Nov 19, 1996·13 cites·11 claims
- 1148US5332647APositive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated articleTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 26, 1994·9 cites·10 claims
- 1248US4985333APositive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcuminTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Jan 15, 1991·8 cites·5 claims
- 1347US5384228AAlkali-developable positive-working photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jan 24, 1995·8 cites·7 claims
- 1439US5599653APattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layerTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 4, 1997·5 cites·2 claims
- 1539US5401605APositive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compoundTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 28, 1995·5 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →