Inventor · disambiguated record
Osamu Uchisawa
Also filed as: UCHISAWA OSAMU
14 granted patents·1,041 citations·filing 1987–2002
95Inventor score
Top patents by PatentIndex Score
14 records- 0198US6134807ADrying processing method and apparatus using sameTOKYO ELECTRON LTD·Filed 1998·Granted Oct 24, 2000·557 cites·10 claims
- 0296US4828219AMetal diaphragm valveMOTOYAMA ENG WORKS·Filed 1987·Granted May 9, 1989·108 cites·16 claims
- 0390US6769697B1GasketACE INC·Filed 2000·Granted Aug 3, 2004·67 cites·4 claims
- 0487US6540840B1Vaporizer for MOCVD and method of vaporizing raw material solutions for MOCVDWATANABE M & CO LTD·Filed 2000·Granted Apr 1, 2003·32 cites·7 claims
- 0582US5551477ADiaphragm-type flow control valve and manual control valve apparatusMOTOYAMA ENG WORKS·Filed 1994·Granted Sep 3, 1996·55 cites·1 claims
- 0681US5524865ADiaphragm valve structureMOTOYAMA ENG WORKS·Filed 1994·Granted Jun 11, 1996·45 cites·20 claims
- 0777US5653419ADiaphragm type high pressure shut-off valveMOTOYAMA ENG WORKS·Filed 1994·Granted Aug 5, 1997·40 cites·13 claims
- 0873US6131307AMethod and device for controlling pressure and flow rateTOKYO ELECTRON LTD·Filed 1998·Granted Oct 17, 2000·23 cites·16 claims
- 0970US6157774AVapor generating method and apparatus using sameTOKYO ELECTRON LTD·Filed 1998·Granted Dec 5, 2000·36 cites·12 claims
- 1069US5516366ASupply control system for semiconductor process gassesMOTOYAMA ENG WORKS·Filed 1994·Granted May 14, 1996·28 cites·20 claims
- 1163US6931203B2Vaporizer for MOCVD and method of vaporizing raw material solutions for MOCVDMOTOYAMA ENG WORKS·Filed 2002·Granted Aug 16, 2005·5 cites·5 claims
- 1261US6105933ADiaphragm valve structureMOTOYAMA ENG WORKS·Filed 1995·Granted Aug 22, 2000·22 cites·1 claims
- 1359US6167323AMethod and system for controlling gas systemTOKYO ELECTRON LTD·Filed 1998·Granted Dec 26, 2000·23 cites·23 claims
- 1445US7744698B2Vaporizer for MOCVD and method of vaporizing raw material solutions for MOCVDWATANABE M & CO LTD·Filed 2002·Granted Jun 29, 2010·0 cites·8 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →