Inventor · disambiguated record
Kunihiko Kodama
Also filed as: KODAMA KUNIHIKO
135 granted patents·31 pending applications·2,241 citations·filing 1992–2025
99Inventor score
Top patents by PatentIndex Score
166 records- 0198US8933144B2Curable composition for imprint, pattern-forming method and patternFUJIFILM CORP·Filed 2014·Granted Jan 13, 2015·50 cites·20 claims
- 0298US8039200B2Photosensitive composition and pattern-forming method using the photosensitive compositionFUJIFILM CORP·Filed 2010·Granted Oct 18, 2011·21 cites·8 claims
- 0398US6492091B2Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Dec 10, 2002·112 cites·20 claims
- 0498US6479211B1Positive photoresist composition for far ultraviolet exposureFUJI PHOTO FILM CO LTD·Filed 2000·Granted Nov 12, 2002·149 cites·24 claims
- 0597US6749987B2Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Jun 15, 2004·43 cites·23 claims
- 0696US8206886B2Photosensitive composition and pattern-forming method using the photosensitive compositionKODAMA KUNIHIKO·Filed 2005·Granted Jun 26, 2012·26 cites·20 claims
- 0795US7625690B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted Dec 1, 2009·24 cites·19 claims
- 0895US7449573B2Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive compositionFUJIFILM CORP·Filed 2005·Granted Nov 11, 2008·18 cites·2 claims
- 0995US5945250APositive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Aug 31, 1999·127 cites·12 claims
- 1094US7799505B2Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive compositionFUJIFILM CORP·Filed 2007·Granted Sep 21, 2010·16 cites·16 claims
- 1194US5270247AAtomic layer epitaxy of compound semiconductorFUJITSU LTD·Filed 1992·Granted Dec 14, 1993·206 cites·12 claims
- 1293US8530540B2Curable composition for imprints, patterning method and patternKODAMA KUNIHIKO·Filed 2009·Granted Sep 10, 2013·16 cites·22 claims
- 1393US8025833B2Curable composition for nanoimprint, and patterning methodFUJIFILM CORP·Filed 2009·Granted Sep 27, 2011·21 cites·41 claims
- 1492US6517991B1Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Feb 11, 2003·36 cites·11 claims
- 1591US6274065B1Process for the preparation of fluorescent compositions, fluorescent compositions and their useCIBA SC HOLDING AG·Filed 1998·Granted Aug 14, 2001·26 cites·4 claims
- 1690US8999221B2Curable composition for imprints, patterning method and patternFUJIFILM CORP·Filed 2013·Granted Apr 7, 2015·6 cites·9 claims
- 1790US6927009B2Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Aug 9, 2005·36 cites·14 claims
- 1889US6506535B1Positive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jan 14, 2003·33 cites·19 claims
- 1989US6291130B1Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Sep 18, 2001·60 cites·14 claims
- 2088US7776512B2Positive photosensitive compositionFUJIFILM CORP·Filed 2009·Granted Aug 17, 2010·6 cites·4 claims
- 2188US7273690B2Positive resist composition for immersion exposure and method of pattern formation with the sameFUJIFILM CORP·Filed 2005·Granted Sep 25, 2007·17 cites·20 claims
- 2288US6858370B2Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Feb 22, 2005·29 cites·19 claims
- 2388US6605409B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Aug 12, 2003·18 cites·32 claims
- 2488US6485883B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Nov 26, 2002·71 cites·21 claims
- 2588US5837420APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Nov 17, 1998·69 cites·5 claims
- 2687US7960087B2Positive photosensitive composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2006·Granted Jun 14, 2011·9 cites·12 claims
- 2787US6787283B1Positive photoresist composition for far ultraviolet exposureFUJI PHOTO FILM CO LTD·Filed 2000·Granted Sep 7, 2004·30 cites·25 claims
- 2886US8012665B2Positive photosensitive composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Sep 6, 2011·7 cites·24 claims
- 2986US6808862B2Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Oct 26, 2004·25 cites·21 claims
- 3085US9335628B2Curable composition for imprints, patterning method and patternKODAMA KUNIHIKO·Filed 2010·Granted May 10, 2016·5 cites·19 claims
- 3185US6258954B1Fluorescent maleimides and uses thereofCIBA SC HOLDING AG·Filed 2000·Granted Jul 10, 2001·30 cites·3 claims
- 3284US8158326B2Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive compositionKODAMA KUNIHIKO·Filed 2008·Granted Apr 17, 2012·4 cites·30 claims
- 3384US7812194B2Positive photosensitive compositionFUJIFILM CORP·Filed 2006·Granted Oct 12, 2010·4 cites·21 claims
- 3484US7189492B2Photosensitive composition and pattern forming method using the sameFUJI PHOTO FILM CO LTD·Filed 2004·Granted Mar 13, 2007·26 cites·23 claims
- 3584US6596458B1Positive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jul 22, 2003·58 cites·8 claims
- 3683US6692884B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Feb 17, 2004·28 cites·18 claims
- 3782US9663671B2Curable composition for imprints and method of storing the sameFUJIFILM CORP·Filed 2014·Granted May 30, 2017·3 cites·14 claims
- 3882US9482950B2Curable composition for imprints, pattern-forming method and patternFUJIFILM CORP·Filed 2013·Granted Nov 1, 2016·3 cites·18 claims
- 3982US7803511B2Positive resist composition for immersion exposure and pattern-forming method using the sameFUJIFILM CORP·Filed 2006·Granted Sep 28, 2010·5 cites·11 claims
- 4082US7371505B2Photosensitive composition and method for forming pattern using the sameFUJIFILM CORP·Filed 2005·Granted May 13, 2008·5 cites·24 claims
- 4181US8883065B2Curable composition for imprints, patterning method and patternKODAMA KUNIHIKO·Filed 2009·Granted Nov 11, 2014·5 cites·17 claims
- 4281US6830867B2Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Dec 14, 2004·19 cites·16 claims
- 4381US5891603APositive working photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1997·Granted Apr 6, 1999·27 cites·10 claims
- 4480US6576392B1Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Jun 10, 2003·47 cites·5 claims
- 4580US6544715B2Positive photoresist composition for far ultraviolet ray exposureFUJI PHOTO FILM CO LTD·Filed 2000·Granted Apr 8, 2003·19 cites·15 claims
- 4680US6505319B1Signal processing circuit and information recording apparatusTOSHIBA KK·Filed 2000·Granted Jan 7, 2003·14 cites·20 claims
- 4779US9507263B2Underlay film composition for imprints and method of forming pattern and pattern formation method using the sameFUJIFILM CORP·Filed 2014·Granted Nov 29, 2016·5 cites·11 claims
- 4879US8703892B2Curable composition for imprints, patterning method and patternKODAMA KUNIHIKO·Filed 2009·Granted Apr 22, 2014·6 cites·15 claims
- 4978US8851624B2Maintenance liquidFUJIFILM CORP·Filed 2013·Granted Oct 7, 2014·2 cites·26 claims
- 5077US6733951B2Positive radiation-sensitive compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted May 11, 2004·15 cites·19 claims
Showing the top 50 of 166 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →