Inventor · disambiguated record
Ya-Chih Wang
Also filed as: WANG YA · WANG YA CHIH
10 granted patents·1 pending application·23 citations·filing 2002–2020
81Inventor score
Top patents by PatentIndex Score
11 records- 0195US9530663B1Method for forming a patternNANYA TECHNOLOGY CORP·Filed 2015·Granted Dec 27, 2016·18 cites·11 claims
- 0287US11021784B2Method of mask layoutYUNGU GUAN TECH CO LTD·Filed 2020·Granted Jun 1, 2021·3 cites·20 claims
- 0357US8697316B2Hard mask spacer structure and fabrication method thereofWANG YA-CHIH·Filed 2012·Granted Apr 15, 2014·1 cites·7 claims
- 0452US7799697B2Patterning method in semiconductor manufacturing process including an array of rectangular blocks and filling featuresNANYA TECHNOLOGY CORP·Filed 2008·Granted Sep 21, 2010·1 cites·6 claims
- 0549US7811723B2Phase-shift mask and method for forming a patternNANYA TECHNOLOGY CORP·Filed 2008·Granted Oct 12, 2010·0 cites·8 claims
- 0649US2020149149A1Mask and vapor deposition deviceYUNGU GUAN TECH CO LTD·Filed 2020·Application pending·0 cites
- 0747US8368869B2Lithography apparatus with an optical fiber moduleNANYA TECHNOLOGY CORP·Filed 2008·Granted Feb 5, 2013·0 cites·18 claims
- 0844US8216946B2Patterning methodSHIU WEI-CHENG·Filed 2009·Granted Jul 10, 2012·0 cites·32 claims
- 0942US9318412B2Method for semiconductor self-aligned patterningNANYA TECHNOLOGY CORP·Filed 2013·Granted Apr 19, 2016·0 cites·10 claims
- 1039US8658051B2Lithography resolution improving methodCHO KUO-YAO·Filed 2008·Granted Feb 25, 2014·0 cites·14 claims
- 1135US6998226B2Method of forming patterned photoresist layerNANYA TECHNOLOGY CORP·Filed 2002·Granted Feb 14, 2006·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →