Inventor · disambiguated record
Shusuke Yoshitake
Also filed as: YOSHITAKE SHUSUKE
17 granted patents·307 citations·filing 1997–2020
94Inventor score
Top patents by PatentIndex Score
17 records- 0191US7643130B2Position measuring apparatus and positional deviation measuring methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Jan 5, 2010·19 cites·20 claims
- 0290US6281510B1Sample transferring method and sample transfer supporting apparatusTOSHIBA KK·Filed 2000·Granted Aug 28, 2001·52 cites·17 claims
- 0383US7554107B2Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatusNUFLARE TECHNOLOGY INC·Filed 2006·Granted Jun 30, 2009·10 cites·17 claims
- 0483US6090176ASample transferring method and sample transfer supporting apparatusTOSHIBA KK·Filed 1998·Granted Jul 18, 2000·62 cites·7 claims
- 0581US8183544B2Correcting substrate for charged particle beam lithography apparatusTSURUTA KAORU·Filed 2009·Granted May 22, 2012·10 cites·8 claims
- 0680US5909030APattern transfer apparatus, an operation management system thereof, and an operation management system for a semiconductor manufacture apparatusTOSHIBA KK·Filed 1997·Granted Jun 1, 1999·45 cites·11 claims
- 0779US8399833B2Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatusYOSHITAKE SHUSUKE·Filed 2010·Granted Mar 19, 2013·5 cites·6 claims
- 0879US6172364B1Charged particle beam irradiation apparatusTOSHIBA KK·Filed 1998·Granted Jan 9, 2001·31 cites·15 claims
- 0970US10572990B2Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing systemNUFLARE TECHNOLOGY INC·Filed 2017·Granted Feb 25, 2020·2 cites·11 claims
- 1069US5912468ACharged particle beam exposure systemTOSHIBA KK·Filed 1997·Granted Jun 15, 1999·22 cites·10 claims
- 1161US5929452AElectrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the sameTOSHIBA KK·Filed 1998·Granted Jul 27, 1999·17 cites·14 claims
- 1259US6676289B2Temperature measuring method in pattern drawing apparatusTOSHIBA KK·Filed 2001·Granted Jan 13, 2004·10 cites·2 claims
- 1356US5850083ACharged particle beam lithograph apparatusTOSHIBA KK·Filed 1997·Granted Dec 15, 1998·12 cites·24 claims
- 1450US8718972B2Electron beam writing apparatus and position displacement amount correcting methodYOSHITAKE SHUSUKE·Filed 2009·Granted May 6, 2014·0 cites·7 claims
- 1548US11475557B2Mask inspection apparatus, electron beam inspection apparatus, mask inspection method, and electron beam inspection methodNUFLARE TECHNOLOGY INC·Filed 2020·Granted Oct 18, 2022·0 cites·10 claims
- 1646US6182369B1Pattern forming apparatusTOSHIBA KK·Filed 1998·Granted Feb 6, 2001·10 cites·6 claims
- 1739US9552963B2Charged particle beam writing apparatus and method thereforYOSHITAKE SHUSUKE·Filed 2011·Granted Jan 24, 2017·0 cites·8 claims
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