Inventor · disambiguated record
Frank Leonard Schadt, Iii
Also filed as: SCHADT FRANK · SCHADT FRANK L · SCHADT FRANK LEONARD · SCHADT III FRANK
42 granted patents·8 pending applications·846 citations·filing 1978–2018
98Inventor score
Top patents by PatentIndex Score
50 records- 0199US6790587B1Fluorinated polymers, photoresists and processes for microlithographyDU PONT·Filed 2000·Granted Sep 14, 2004·141 cites·66 claims
- 0296US6849377B2Photoresists, polymers and processes for microlithographyDU PONT·Filed 2002·Granted Feb 1, 2005·84 cites·20 claims
- 0396US4225665APhotographic element in which the antistatic layer is interlinked in the baseDU PONT·Filed 1978·Granted Sep 30, 1980·81 cites·16 claims
- 0495US6872503B2Copolymers for photoresists and processes thereforDU PONT·Filed 2001·Granted Mar 29, 2005·74 cites·5 claims
- 0592US6503686B1Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithographyDU PONT·Filed 2000·Granted Jan 7, 2003·53 cites·49 claims
- 0687US6875555B1Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes)DU PONT·Filed 2003·Granted Apr 5, 2005·15 cites·51 claims
- 0787US6218074B1Flexible, flame-retardant, aqueous-processable photoimageable composition for coating flexible printed circuitsDU PONT·Filed 1999·Granted Apr 17, 2001·102 cites·48 claims
- 0887US5985998ASolvent dispersible interpenetrating polymer networksDU PONT·Filed 1999·Granted Nov 16, 1999·41 cites·8 claims
- 0986US8652998B2Branched copolymer/anthranilic diamide compositions for propagule coatingTAM WILSON·Filed 2011·Granted Feb 18, 2014·3 cites·15 claims
- 1083US4668748ACrosslinkable antistatic polymers and their manufactureDU PONT·Filed 1984·Granted May 26, 1987·36 cites·4 claims
- 1178US7834113B2Photoresist compositions and processes for preparing the sameDU PONT·Filed 2006·Granted Nov 16, 2010·4 cites·18 claims
- 1277US7834209B2Hydrofluoroalkanesulfonic acids from fluorovinyl ethersDU PONT·Filed 2006·Granted Nov 16, 2010·2 cites·9 claims
- 1377US6884564B2Fluorinated polymers having ester groups and photoresists for microlithographyDU PONT·Filed 2002·Granted Apr 26, 2005·13 cites·37 claims
- 1477US5886101ASolvent dispersible interpenetrating polymer networksDU PONT·Filed 1993·Granted Mar 23, 1999·22 cites·27 claims
- 1576US6899995B2Protecting groups in polymers, photoresists and processes for microlithographyDU PONT·Filed 2001·Granted May 31, 2005·12 cites·30 claims
- 1674US7217495B2Fluorinated polymers, photoresists and processes for microlithographyDU PONT·Filed 2004·Granted May 15, 2007·10 cites·32 claims
- 1773US6884562B1Photoresists and processes for microlithographyDU PONT·Filed 1999·Granted Apr 26, 2005·36 cites·28 claims
- 1870US7166416B2Protecting groups in polymers, photoresists and processes for microlithographyDU PONT·Filed 2005·Granted Jan 23, 2007·2 cites·24 claims
- 1970US6974657B2Compositions for microlithographyDU PONT·Filed 2001·Granted Dec 13, 2005·10 cites·2 claims
- 2070US5728505AFlexible, aqueous processable, photoimageable permanent coatings for printed circuitsDU PONT·Filed 1997·Granted Mar 17, 1998·30 cites·30 claims
- 2167US5643657AAqueous processable, multilayer, photoimageable permanent coatings for printed circuitsDU PONT·Filed 1995·Granted Jul 1, 1997·27 cites·39 claims
- 2263US7108953B2Dissolution inhibitors in photoresist compositions for microlithographyDU PONT·Filed 2001·Granted Sep 19, 2006·7 cites·38 claims
- 2359US7261993B2Photoresists and processes for microlithographyDU PONT·Filed 2004·Granted Aug 28, 2007·12 cites·16 claims
- 2453US8048604B2Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethersDU PONT·Filed 2010·Granted Nov 1, 2011·0 cites·1 claims
- 2553US7264914B2Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithographyDU PONT·Filed 2003·Granted Sep 4, 2007·2 cites·45 claims
- 2652US10585356B2Projection exposure apparatus and method for measuring a projection lensZEISS CARL SMT GMBH·Filed 2018·Granted Mar 10, 2020·0 cites·24 claims
- 2752US8270145B2Screen-printable encapsulants based on soluble polybenzoxazolesDUEBER THOMAS EUGENE·Filed 2007·Granted Sep 18, 2012·1 cites·22 claims
- 2851US4810624APhotographic element with antistatic polymersDU PONT·Filed 1987·Granted Mar 7, 1989·9 cites·26 claims
- 2950US7205086B2Multilayer elements containing photoresist compositions and their use in microlithographyDU PONT·Filed 2001·Granted Apr 17, 2007·3 cites·24 claims
- 3048US9312485B2Process and materials for making contained layers and devices made with sameDU PONT·Filed 2013·Granted Apr 12, 2016·0 cites·7 claims
- 3148US7408013B2Low-polydispersity photoimageable polymers and photoresists and processes for microlithographyCOMMW SCIENT IND RES ORG·Filed 2004·Granted Aug 5, 2008·1 cites·33 claims
- 3246US7507522B2Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomersDU PONT·Filed 2005·Granted Mar 24, 2009·0 cites·18 claims
- 3346US2004248039A1Photoresist compositions and processes for preparing the sameFiled 2004·Application pending·0 cites
- 3446US2004242798A1Photoresist compositions and processes for preparing the sameFiled 2004·Application pending·0 cites
- 3546US2005079442A1Halo resistent, photoimagable coverlay compositions, having advantageous application and removal properties, and methods relating theretoFiled 2004·Application pending·0 cites
- 3645US7326796B2Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithographyDU PONT·Filed 2003·Granted Feb 5, 2008·0 cites·4 claims
- 3745US2014243449A1Method of preparing encapsulated pigment dispersions with two encapsulation stepsLEE HEE HYUN·Filed 2011·Application pending·0 cites
- 3845US2014249248A1Inkjet ink comprising encapsulated pigment dispersions with two encapsulation stepsLEE HEE HYUN·Filed 2011·Application pending·0 cites
- 3942US7312287B2Fluorinated polymers useful as photoresists, and processes for microlithographyDU PONT·Filed 2003·Granted Dec 25, 2007·0 cites·12 claims
- 4040US7696292B2Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithographyCOMMW SCIENT IND RES ORG·Filed 2004·Granted Apr 13, 2010·3 cites·5 claims
- 4140US4460679ALow coating weight silver halide elementDU PONT·Filed 1983·Granted Jul 17, 1984·5 cites·5 claims
- 4239US7019092B2Fluorinated copolymers for microlithographyDU PONT·Filed 2003·Granted Mar 28, 2006·0 cites·16 claims
- 4339US2005203262A1Fluorinated polymers, photoresists and processes for microlithographyFiled 2003·Application pending·0 cites
- 4438US2004092686A1Polycyclic fluorine-containing polymers and photoresists for microlithographyFiled 2002·Application pending·0 cites
- 4536US8431491B2Method for membrane protection during reactive ion/plasma etching processing for via or cavity formation in semiconductor manufactureBALUT CHESTER E·Filed 2009·Granted Apr 30, 2013·0 cites·7 claims
- 4636US7022457B2Photoresists with hydroxylated, photoacid-cleavable groupsDU PONT·Filed 2003·Granted Apr 4, 2006·1 cites·29 claims
- 4736US2004106062A1Photoacid generators in photoresist compositions for microlithographyFiled 2001·Application pending·0 cites
- 4835US7045268B2Polymers blends and their use in photoresist compositions for microlithographyDU PONT·Filed 2001·Granted May 16, 2006·2 cites·16 claims
- 4931US6951705B2Polymers for photoresist compositions for microlithographyDU PONT·Filed 2001·Granted Oct 4, 2005·2 cites·7 claims
- 5031US4383023ADye mordanting developmentDU PONT·Filed 1981·Granted May 10, 1983·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →