Inventor · disambiguated record
Sang-Dai Lee
Also filed as: LEE SANG-DAI
9 granted patents·2 pending applications·121 citations·filing 1999–2015
87Inventor score
Files withDONGJIN SEMICHEM CO LTD6SAMSUNG DISPLAY CO LTD2LG DISPLAY CO LTD1LG PHILIPS LCD CO LTD1SAMSUNG ELECTRONICS CO LTD1
Top patents by PatentIndex Score
11 records- 0183US6579668B1Photoresist remover compositionDONGJIN SEMICHEM CO LTD·Filed 2000·Granted Jun 17, 2003·24 cites·9 claims
- 0279US6958312B2Composition and method for removing copper-compatible resistLG PHILIPS LCD CO LTD·Filed 2002·Granted Oct 25, 2005·16 cites·5 claims
- 0371US6140027APhotoresist remover compositionDONGJIN SEMICHEM CO LTD·Filed 1999·Granted Oct 31, 2000·42 cites·10 claims
- 0465US6183942B1Thinner composition for removing spin-on-glass and photoresistDONGJIN SEMICHEM CO LTD·Filed 1999·Granted Feb 6, 2001·25 cites·5 claims
- 0561US6774097B2Resist stripper compositionDONGJIN SEMICHEM CO LTD·Filed 2001·Granted Aug 10, 2004·7 cites·4 claims
- 0657US6908892B2Photoresist remover compositionDONGJIN SEMICHEM CO LTD·Filed 2001·Granted Jun 21, 2005·5 cites·4 claims
- 0756US6683034B1Stripper composition for negative chemically amplified resistDONGJIN SEMICHEM CO LTD·Filed 2000·Granted Jan 27, 2004·2 cites·5 claims
- 0851US10040741B2Method for manufacturing high purity glycol based compoundSAMSUNG DISPLAY CO LTD·Filed 2015·Granted Aug 7, 2018·0 cites·9 claims
- 0950US7662763B2Composition and method for removing copper-compatible resistLG DISPLAY CO LTD·Filed 2005·Granted Feb 16, 2010·0 cites·7 claims
- 1049US2010159400A1Composition for removing a photoresist pattern and method of forming a metal pattern using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1142US2015147836A1Composition for cleaning flat panel display and method for manufacturing display device using the sameSAMSUNG DISPLAY CO LTD·Filed 2014·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Sang-Dai Lee files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →