Inventor · disambiguated record
Dawn Hopper
Also filed as: HOPPER DAWN · HOPPER DAWN M
64 granted patents·1 pending application·1,760 citations·filing 1998–2015
99Inventor score
Files withADVANCED MICRO DEVICES INC56SPANSION LLC5AMERICAN PANEL TEC CORP1CYPRESS SEMICONDUCTOR CORP1FASL LLC1
Top patents by PatentIndex Score
65 records- 0194US6566283B1Silane treatment of low dielectric constant materials in semiconductor device manufacturingADVANCED MICRO DEVICES INC·Filed 2002·Granted May 20, 2003·72 cites·18 claims
- 0294US6436808B1NH3/N2-plasma treatment to prevent organic ILD degradationADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 20, 2002·82 cites·30 claims
- 0394US6030901APhotoresist stripping without degrading low dielectric constant materialsADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 29, 2000·151 cites·18 claims
- 0493US6528432B1H2-or H2/N2-plasma treatment to prevent organic ILD degradationADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 4, 2003·68 cites·34 claims
- 0592US6562416B2Method of forming low resistance viasADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·57 cites·12 claims
- 0691US6756672B1Use of sic for preventing copper contamination of low-k dielectric layersADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 29, 2004·65 cites·7 claims
- 0790US6653190B1Flash memory with controlled wordline widthADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 25, 2003·44 cites·20 claims
- 0890US6455409B1Damascene processing using a silicon carbide hard maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 24, 2002·48 cites·21 claims
- 0990US6406960B1Process for fabricating an ONO structure having a silicon-rich silicon nitride layerADVANCED MICRO DEVICES INC·Filed 1999·Granted Jun 18, 2002·83 cites·6 claims
- 1088US6809402B1Reflowable-doped HDP filmADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 26, 2004·53 cites·18 claims
- 1187US6599839B1Plasma etch process for nonhomogenous filmADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 29, 2003·36 cites·10 claims
- 1287US6429121B1Method of fabricating dual damascene with silicon carbide via mask/ARCADVANCED MICRO DEVICES INC·Filed 2001·Granted Aug 6, 2002·36 cites·20 claims
- 1386US6613657B1BPSG, SA-CVD liner/P-HDP gap fillADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 2, 2003·31 cites·12 claims
- 1486US6407009B1Methods of manufacture of uniform spin-on filmsADVANCED MICRO DEVICES INC·Filed 1998·Granted Jun 18, 2002·74 cites·31 claims
- 1585US6713874B1Semiconductor devices with dual nature capping/arc layers on organic-doped silica glass inter-layer dielectricsADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 30, 2004·37 cites·9 claims
- 1685US6518646B1Semiconductor device with variable composition low-k inter-layer dielectric and method of makingADVANCED MICRO DEVICES INC·Filed 2001·Granted Feb 11, 2003·40 cites·14 claims
- 1785US6066574AHot plate cure process for BCB low k interlevel dielectricADVANCED MICRO DEVICES INC·Filed 1998·Granted May 23, 2000·75 cites·20 claims
- 1884US6677679B1Use of SiO2/Sin for preventing copper contamination of low-k dielectric layersADVANCED MICRO DEVICES INC·Filed 2001·Granted Jan 13, 2004·37 cites·9 claims
- 1984US6482755B1HDP deposition hillock suppression method in integrated circuitsADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 19, 2002·29 cites·18 claims
- 2081US6395644B1Process for fabricating a semiconductor device using a silicon-rich silicon nitride ARCADVANCED MICRO DEVICES INC·Filed 2000·Granted May 28, 2002·26 cites·9 claims
- 2181US6348410B1Low temperature hillock suppression method in integrated circuit interconnectsADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 19, 2002·24 cites·12 claims
- 2280US6458677B1Process for fabricating an ONO structureADVANCED MICRO DEVICES INC·Filed 1999·Granted Oct 1, 2002·57 cites·15 claims
- 2379US6576982B1Use of sion for preventing copper contamination of dielectric layerADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 10, 2003·27 cites·2 claims
- 2477US6436766B1Process for fabricating high density memory cells using a polysilicon hard maskADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 20, 2002·36 cites·22 claims
- 2577US6093973AHard mask for metal patterningADVANCED MICRO DEVICES INC·Filed 1998·Granted Jul 25, 2000·30 cites·7 claims
- 2674US6900121B1Laser thermal annealing to eliminate oxide voidingADVANCED MICRO DEVICES INC·Filed 2002·Granted May 31, 2005·15 cites·18 claims
- 2774US6645853B1Interconnects with improved barrier layer adhesionADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 11, 2003·16 cites·13 claims
- 2874US6607925B1Hard mask removal process including isolation dielectric refillADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 19, 2003·16 cites·12 claims
- 2973US6576545B1Semiconductor devices with dual nature capping/ARC layers on fluorine doped silica glass inter-layer dielectrics and method of forming capping/ARC layersADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 10, 2003·19 cites·20 claims
- 3072US6723634B1Method of forming interconnects with improved barrier layer adhesionADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 20, 2004·18 cites·16 claims
- 3172US6225240B1Rapid acceleration methods for global planarization of spin-on filmsADVANCED MICRO DEVICES INC·Filed 1998·Granted May 1, 2001·39 cites·20 claims
- 3271US6867063B1Organic spin-on anti-reflective coating over inorganic anti-reflective coatingADVANCED MICRO DEVICES INC·Filed 2002·Granted Mar 15, 2005·13 cites·10 claims
- 3371US6530340B2Apparatus for manufacturing planar spin-on filmsADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 11, 2003·38 cites·26 claims
- 3469US7118967B1Protection of charge trapping dielectric flash memory devices from UV-induced charging in BEOL processingSPANSION LLC·Filed 2003·Granted Oct 10, 2006·15 cites·20 claims
- 3569US6803265B1Liner for semiconductor memories and manufacturing method thereforFASL LLC·Filed 2002·Granted Oct 12, 2004·15 cites·20 claims
- 3668US6784095B1Phosphine treatment of low dielectric constant materials in semiconductor device manufacturingADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 31, 2004·14 cites·14 claims
- 3767US7297592B1Semiconductor memory with data retention linerSPANSION LLC·Filed 2005·Granted Nov 20, 2007·2 cites·20 claims
- 3867US6317642B1Apparatus and methods for uniform scan dispensing of spin-on materialsADVANCED MICRO DEVICES INC·Filed 1998·Granted Nov 13, 2001·32 cites·22 claims
- 3966US7070911B1Structure and method for reducing standing waves in a photoresistADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 4, 2006·8 cites·18 claims
- 4065US6969654B1Flash NVROM devices with UV charge immunityADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 29, 2005·12 cites·5 claims
- 4165US6479898B1Dielectric treatment in integrated circuit interconnectsADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 12, 2002·9 cites·10 claims
- 4264US6656830B1Dual damascene with silicon carbide middle etch stop layer/ARCADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 2, 2003·12 cites·10 claims
- 4363US9477619B2Programmable latency count to achieve higher memory bandwidthCYPRESS SEMICONDUCTOR CORP·Filed 2013·Granted Oct 25, 2016·1 cites·20 claims
- 4463US6686232B1Ultra low deposition rate PECVD silicon nitrideADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 3, 2004·8 cites·19 claims
- 4561US6806165B1Isolation trench fill processADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 19, 2004·9 cites·9 claims
- 4661US6410458B1Method and system for eliminating voids in a semiconductor deviceADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 25, 2002·9 cites·8 claims
- 4760US7977797B2Integrated circuit with contact region and multiple etch stop insulation layerSPANSION LLC·Filed 2009·Granted Jul 12, 2011·1 cites·15 claims
- 4860US7071562B2Interconnects with improved barrier layer adhesionADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 4, 2006·7 cites·10 claims
- 4958US6136729AMethod for improving semiconductor dielectricsADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 24, 2000·22 cites·34 claims
- 5057US6399446B1Process for fabricating high density memory cells using a metallic hard maskADVANCED MICRO DEVICES INC·Filed 1999·Granted Jun 4, 2002·21 cites·24 claims
Showing the top 50 of 65 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →