Inventor · disambiguated record
Hiroto Yukawa
Also filed as: YUKAWA HIROTO
14 granted patents·4 pending applications·389 citations·filing 1999–2004
93Inventor score
Files withTOKYO OHKA KOGYO CO LTD14
Top patents by PatentIndex Score
18 records- 0196US6153733A(Disulfonyl diazomethane compounds)TOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Nov 28, 2000·254 cites·6 claims
- 0289US6180313B1Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jan 30, 2001·45 cites·16 claims
- 0372US6340553B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jan 22, 2002·26 cites·14 claims
- 0467US6284430B1Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 4, 2001·8 cites·5 claims
- 0566US6387587B1Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 14, 2002·22 cites·14 claims
- 0655US6255041B1Method for formation of patterned resist layerTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 3, 2001·16 cites·10 claims
- 0754US6890697B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted May 10, 2005·2 cites·22 claims
- 0854US6869745B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 22, 2005·2 cites·11 claims
- 0950US6815144B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 9, 2004·2 cites·11 claims
- 1044US6649322B2Positive resist composition and positive resist base material using the sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 18, 2003·6 cites·13 claims
- 1143US2005042544A1Positive-working chemical-amplification photoresist compositionFiled 2004·Application pending·0 cites
- 1242US6773863B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 10, 2004·0 cites·3 claims
- 1342US6485887B2Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 26, 2002·4 cites·4 claims
- 1439US6548229B2Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Apr 15, 2003·0 cites·4 claims
- 1534US7147984B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Dec 12, 2006·2 cites·5 claims
- 1632US2002028407A1Positive-working chemical-amplification photoresist compositionFiled 2001·Application pending·0 cites
- 1726US2004023163A1Positive-working chemical-amplification photoresist compositionFiled 2003·Application pending·0 cites
- 1825US2002119393A1Positive-working chemical-amplification photoresist compositionFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →