Inventor · disambiguated record
Kazuya Ota
Also filed as: OTA KAZUYA
68 granted patents·9 pending applications·6,015 citations·filing 1990–2024
99Inventor score
Top patents by PatentIndex Score
77 records- 0199US6590634B1Exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jul 8, 2003·843 cites·50 claims
- 0299US6549269B1Exposure apparatus and an exposure methodNIKON CORP·Filed 2000·Granted Apr 15, 2003·601 cites·56 claims
- 0399US6400441B1Projection exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jun 4, 2002·707 cites·36 claims
- 0499US6341007B1Exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jan 22, 2002·1k cites·25 claims
- 0598US7177008B2Exposure apparatus and methodNIKON CORP·Filed 2004·Granted Feb 13, 2007·135 cites·15 claims
- 0698US6359678B1Exposure apparatus, method for producing the same, and exposure methodNIKON CORP·Filed 2000·Granted Mar 19, 2002·154 cites·111 claims
- 0797US6798491B2Exposure apparatus and an exposure methodNIKON CORP·Filed 2001·Granted Sep 28, 2004·103 cites·26 claims
- 0897US6549270B1Exposure apparatus, exposure method and method for manufacturing devicesNIKON CORP·Filed 2000·Granted Apr 15, 2003·107 cites·87 claims
- 0996US6594334B1Exposure method and exposure apparatusNIKON CORP·Filed 2000·Granted Jul 15, 2003·75 cites·20 claims
- 1096US6153886AAlignment apparatus in projection exposure apparatusNIKON CORP·Filed 1999·Granted Nov 28, 2000·175 cites·48 claims
- 1195US6406820B1Exposure method for a projection optical systemNIKON CORP·Filed 2000·Granted Jun 18, 2002·56 cites·28 claims
- 1295US5489986APosition detecting apparatusNIKON CORP·Filed 1994·Granted Feb 6, 1996·119 cites·8 claims
- 1394US6727980B2Apparatus and method for pattern exposure and method for adjusting the apparatusNIKON CORP·Filed 2001·Granted Apr 27, 2004·55 cites·39 claims
- 1494US5506684AProjection scanning exposure apparatus with synchronous mask/wafer alignment systemNIKON CORP·Filed 1995·Granted Apr 9, 1996·172 cites·27 claims
- 1592US6699630B2Method and apparatus for exposure, and device manufacturing methodNIKON CORP·Filed 2002·Granted Mar 2, 2004·46 cites·28 claims
- 1692US6645701B1Exposure method and exposure apparatusNIKON CORP·Filed 2000·Granted Nov 11, 2003·48 cites·6 claims
- 1792US5416562AMethod of detecting a position and apparatus thereforNIKON CORP·Filed 1994·Granted May 16, 1995·74 cites·17 claims
- 1892US5160849ADiffraction-type displacement detector for alignment of mask and waferNIKON CORP·Filed 1991·Granted Nov 3, 1992·81 cites·7 claims
- 1992US5151750AAlignment apparatusNIKON CORP·Filed 1990·Granted Sep 29, 1992·88 cites·13 claims
- 2090US7211543B2Photocatalyst compositionASAHI CHEMICAL IND·Filed 2002·Granted May 1, 2007·44 cites·26 claims
- 2190US5347356ASubstrate aligning device using interference light generated by two beams irradiating diffraction gratingNIKON CORP·Filed 1992·Granted Sep 13, 1994·71 cites·19 claims
- 2289US5721607AAlignment method and apparatusNIKON CORP·Filed 1995·Granted Feb 24, 1998·71 cites·15 claims
- 2389US5488230ADouble-beam light source apparatus, position detecting apparatus and aligning apparatusNIKON CORP·Filed 1993·Granted Jan 30, 1996·47 cites·29 claims
- 2488US6097473AExposure apparatus and positioning methodNIKON CORP·Filed 1997·Granted Aug 1, 2000·67 cites·60 claims
- 2588US5070250APosition detection apparatus with adjustable beam and interference fringe positionsNIKON CORP·Filed 1991·Granted Dec 3, 1991·61 cites·2 claims
- 2687US5118953ASubstrate alignment apparatus using diffracted and reflected radiation beamsNIKON CORP·Filed 1990·Granted Jun 2, 1992·54 cites·11 claims
- 2786US5914774AProjection exposure apparatus with function to measure imaging characteristics of projection optical systemNIKON CORP·Filed 1995·Granted Jun 22, 1999·61 cites·45 claims
- 2885US6061119AMethod of measuring image-forming error of projection optical system, method of manufacturing exposure apparatus, and method of manufacturing semiconductor deviceNIKON CORP·Filed 1998·Granted May 9, 2000·56 cites·22 claims
- 2985US6018384AProjection exposure systemNIKON CORP·Filed 1995·Granted Jan 25, 2000·43 cites·63 claims
- 3083US6483569B2Exposure method and exposure apparatusNIKON CORP·Filed 2001·Granted Nov 19, 2002·18 cites·10 claims
- 3183US6228544B1Exposure method utilizing pre-exposure reduction of substrate temperatureNIKON CORP·Filed 1999·Granted May 8, 2001·42 cites·24 claims
- 3283US5153678AMethod of determining regularity of a pattern array to enable positioning of patterns thereof relative to a reference positionNIKON CORP·Filed 1990·Granted Oct 6, 1992·42 cites·2 claims
- 3382US5601957AMicro devices manufacturing method comprising the use of a second pattern overlying an alignment mark to reduce flatteningNIKON CORP·Filed 1995·Granted Feb 11, 1997·43 cites·10 claims
- 3482US5171999AAdjustable beam and interference fringe positionNIKON CORP·Filed 1991·Granted Dec 15, 1992·40 cites·9 claims
- 3581US6813002B2Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing methodNIKON CORP·Filed 2003·Granted Nov 2, 2004·15 cites·18 claims
- 3681US5561606AMethod for aligning shot areas on a substrateNIKON CORP·Filed 1995·Granted Oct 1, 1996·48 cites·26 claims
- 3780US5978071AProjection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stageNIKON CORP·Filed 1998·Granted Nov 2, 1999·43 cites·53 claims
- 3880US5689339AAlignment apparatusNIKON CORP·Filed 1995·Granted Nov 18, 1997·48 cites·18 claims
- 3980US5477309AAlignment apparatusNIKON CORP·Filed 1995·Granted Dec 19, 1995·49 cites·11 claims
- 4079US6057908AExposure condition measurement methodNIKON CORP·Filed 1997·Granted May 2, 2000·43 cites·31 claims
- 4176US6388735B1Projection exposure systemNIKON CORP·Filed 2000·Granted May 14, 2002·10 cites·21 claims
- 4275US5942357AMethod of measuring baseline amount in a projection exposure apparatusNIKON CORP·Filed 1997·Granted Aug 24, 1999·35 cites·15 claims
- 4374US10234766B2Mask protection device, exposure apparatus, and method for manufacturing deviceNIKON CORP·Filed 2017·Granted Mar 19, 2019·1 cites·16 claims
- 4473US6249336B1Projection exposure systemNIKON CORP·Filed 1999·Granted Jun 19, 2001·23 cites·63 claims
- 4572US6485153B2Exposure apparatus and methodNIKON CORP·Filed 1999·Granted Nov 26, 2002·30 cites·27 claims
- 4672US6236448B1Projection exposure systemNIKON CORP·Filed 1999·Granted May 22, 2001·22 cites·55 claims
- 4772US5831739AAlignment methodNIKON CORP·Filed 1996·Granted Nov 3, 1998·32 cites·18 claims
- 4871US5715063AProjection exposure methodNIKON CORP·Filed 1996·Granted Feb 3, 1998·32 cites·12 claims
- 4968US6566022B2Micro devices manufacturing method and apparatus thereforNIKON CORP·Filed 2001·Granted May 20, 2003·7 cites·19 claims
- 5068US6535272B2Position transducer and exposure apparatus with sameNIKON CORP·Filed 2001·Granted Mar 18, 2003·8 cites·24 claims
Showing the top 50 of 77 patent records by PatentIndex Score.
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