Inventor · disambiguated record
Yuichi Setsuhara
Also filed as: SETSUHARA YUICHI
9 granted patents·14 pending applications·48 citations·filing 2000–2015
85Inventor score
Files withSETSUHARA YUICHI9EMD CORP3NISSIN ELECTRIC CO LTD3JAPAN SCIENCE & TECH AGENCY2NISSIN ELECTRIC CO LTD AND EMD2
Top patents by PatentIndex Score
23 records- 0177US7880392B2Plasma producing method and apparatus as well as plasma processing apparatusNISSIN ELECTRIC CO LTD·Filed 2006·Granted Feb 1, 2011·5 cites·16 claims
- 0273US7785441B2Plasma generator, plasma control method, and method of producing substrateJAPAN SCIENCE & TECH AGENCY·Filed 2003·Granted Aug 31, 2010·9 cites·10 claims
- 0372US7567037B2High frequency power supply device and plasma generatorJAPAN SCIENCE & TECH AGENCY·Filed 2004·Granted Jul 28, 2009·17 cites·24 claims
- 0472US7098599B2Plasma generatorJAPAN SCIENCE & TECH CORP·Filed 2000·Granted Aug 29, 2006·10 cites·5 claims
- 0563US9078336B2Radio-frequency antenna unit and plasma processing apparatusSETSUHARA YUICHI·Filed 2009·Granted Jul 7, 2015·1 cites·12 claims
- 0663US8916034B2Thin-film forming sputtering systemSETSUHARA YUICHI·Filed 2009·Granted Dec 23, 2014·2 cites·10 claims
- 0763US7988835B2Silicon dot forming method and silicon dot forming apparatusNISSIN ELECTRIC CO LTD·Filed 2006·Granted Aug 2, 2011·2 cites·18 claims
- 0859US8444806B2Plasma generator, plasma control method and method of producing substrateMIYAKE SHOJI·Filed 2010·Granted May 21, 2013·2 cites·8 claims
- 0955US2010189921A1Plasma generating method, plasma generating apparatus, and plasma processing apparatusNISSIN ELECTRIC CO LTD AND EMD·Filed 2010·Application pending·0 cites
- 1054US2007193513A1Plasma generating method, plasma generating apparatus, and plasma processing apparatusEMD CORP·Filed 2007·Application pending·0 cites
- 1152US2007144440A1Plasma producing method and apparatus as well as plasma processing apparatusNISSIN ELECTRIC CO LTD·Filed 2006·Application pending·0 cites
- 1247US2007193512A1Plasma generating method, plasma generating apparatus, and plasma processing apparatusNISSIN ELECTRIC CO LTD AND EMD·Filed 2007·Application pending·0 cites
- 1344US8931433B2Plasma processing apparatusSETSUHARA YUICHI·Filed 2008·Granted Jan 13, 2015·0 cites·12 claims
- 1443US2015132960A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1543US2010206846A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 1640US2007144672A1Plasma producing method and apparatus as well as plasma processing apparatusEMD CORP·Filed 2006·Application pending·0 cites
- 1737US2013220548A1Plasma processing deviceSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 1837US2014216928A1Thin-film formation sputtering deviceSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 1936US2014210337A1Antenna for plasma processing device, and plasma processing device using the sameSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 2035US2012031563A1Plasma processing deviceSETSUHARA YUICHI·Filed 2010·Application pending·0 cites
- 2135US2013192759A1Plasma processing deviceSETSUHARA YUICHI·Filed 2011·Application pending·0 cites
- 2234US2012031562A1Plasma processing apparatusSETSUHARA YUICHI·Filed 2010·Application pending·0 cites
- 2332US2007293056A1Surface Modification Method for Solid Sample, Impurity Activation Method, and Method for Manufacturing Semiconductor DeviceEMD CORP·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →