Inventor · disambiguated record
Yoshiki Hishiro
Also filed as: HISHIRO YOSHIKI
23 granted patents·1 pending application·244 citations·filing 1994–2013
96Inventor score
Top patents by PatentIndex Score
24 records- 0196US7538036B2Methods of forming openings, and methods of forming container capacitorsMICRON TECHNOLOGY INC·Filed 2005·Granted May 26, 2009·36 cites·8 claims
- 0289US7153778B2Methods of forming openings, and methods of forming container capacitorsMICRON TECHNOLOGY INC·Filed 2004·Granted Dec 26, 2006·34 cites·29 claims
- 0388US6599683B1Photoresist developer with reduced resist toppling and method of using sameMICRON TECHNOLOGY INC·Filed 2002·Granted Jul 29, 2003·28 cites·45 claims
- 0487US7687406B2Methods of eliminating pattern collapse on photoresist patternsMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 30, 2010·8 cites·10 claims
- 0585US5731110APhotoresist composition for use in color filtersSUMITOMO CHEMICAL CO·Filed 1996·Granted Mar 24, 1998·21 cites·8 claims
- 0682US8956981B2Methods of eliminating pattern collapse on photoresist patternsMICRON TECHNOLOGY INC·Filed 2013·Granted Feb 17, 2015·3 cites·4 claims
- 0781US8163468B2Method of reducing photoresist defects during fabrication of a semiconductor deviceHISHIRO YOSHIKI·Filed 2008·Granted Apr 24, 2012·6 cites·8 claims
- 0879US8552538B2Methods of eliminating pattern collapse on photoresist patternsDALEY JON·Filed 2010·Granted Oct 8, 2013·3 cites·10 claims
- 0974US7119025B2Methods of eliminating pattern collapse on photoresist patternsMICRON TECHNOLOGY INC·Filed 2004·Granted Oct 10, 2006·11 cites·17 claims
- 1073US5686585AAzo dyes for use in color filters and method for production of color filtersSUMITOMO CHEMICAL CO·Filed 1994·Granted Nov 11, 1997·10 cites·11 claims
- 1172US5876895APhotosensitive resin composition for color filterSUMITOMO CHEMICAL CO·Filed 1996·Granted Mar 2, 1999·35 cites·5 claims
- 1271US7846623B2Resist pattern and reflow technologyMICRON TECHNOLOGY INC·Filed 2008·Granted Dec 7, 2010·2 cites·14 claims
- 1369US6713404B2Methods of forming semiconductor constructionsMICRON TECHNOLOGY INC·Filed 2002·Granted Mar 30, 2004·9 cites·19 claims
- 1467US8859195B2Methods of lithographically patterning a substrateHISHIRO YOSHIKI·Filed 2012·Granted Oct 14, 2014·1 cites·14 claims
- 1566US6875552B2Photoresist composition and method of makingMICRON TECHNOLOGY INC·Filed 2002·Granted Apr 5, 2005·6 cites·40 claims
- 1663US5478680AColor filterSUMITOMO CHEMICAL CO·Filed 1994·Granted Dec 26, 1995·17 cites·14 claims
- 1755US7371509B2Resist pattern and reflow technologyMICRON TECHNOLOGY INC·Filed 2004·Granted May 13, 2008·3 cites·35 claims
- 1852US6943432B2Semiconductor constructionsMICRON TECHNOLOGY INC·Filed 2003·Granted Sep 13, 2005·2 cites·11 claims
- 1951US8309297B2Methods of lithographically patterning a substrateHISHIRO YOSHIKI·Filed 2007·Granted Nov 13, 2012·0 cites·23 claims
- 2048US6905973B2Methods of forming semiconductor constructionsMICRON TECHNOLOGY INC·Filed 2004·Granted Jun 14, 2005·1 cites·20 claims
- 2147US2011042622A1Resist pattern and reflow technologyHISHIRO YOSHIKI·Filed 2010·Application pending·0 cites
- 2246US5492790APositive photoresist composition containing a dissolution inhibitor and a dye in an organic solventSUMITOMO CHEMICAL CO·Filed 1994·Granted Feb 20, 1996·8 cites·16 claims
- 2345US7169545B2Resist exposure system and method of forming a pattern on a resistMICRON TECHNOLOGY INC·Filed 2004·Granted Jan 30, 2007·0 cites·11 claims
- 2437US7402379B2Resist exposure system and method of forming a pattern on a resistMICRON TECHNOLOGY INC·Filed 2006·Granted Jul 22, 2008·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →